P

Inventor

MAEDA TAKEO

JP37 patents
⚠️ This page may combine multiple inventors who share the name “MAEDA TAKEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

26 patents
US5506168AApr 9, 1996

Method for manufacturing semiconductor device

TOSHIBA KK89 citations96
US5278099AJan 11, 1994

Method for manufacturing a semiconductor device having wiring electrodes

TOSHIBA KK56 citations96
US5677229AOct 14, 1997

Method for manufacturing semiconductor device isolation region

TOSHIBA KK22 citations92
US5512772AApr 30, 1996

Semiconductor device having bipolar transistor and MOS transistor

TOSHIBA KK27 citations92
US5091760AFeb 25, 1992

Semiconductor device

TOSHIBA KK32 citations92
US4931407AJun 5, 1990

Method for manufacturing integrated bipolar and MOS transistors

TOSHIBA KK24 citations92
US4900257AFeb 13, 1990

Method of making a polycide gate using a titanium nitride capping layer

TOSHIBA KK29 citations92
US4663825AMay 12, 1987

Method of manufacturing semiconductor device

TOSHIBA KK26 citations92
US4643777AFeb 17, 1987

Method of manufacturing a semiconductor device comprising resistors of high and low resistances

TOSHIBA KK28 citations92
US5576572ANov 19, 1996

Semiconductor integrated circuit device and method of manufacturing the same

TOSHIBA KK25 citations91
US5442226AAug 15, 1995

Bipolar transistor having an emitter electrode formed of polysilicon

TOSHIBA KK24 citations91
US5340751AAug 23, 1994

Method of manufacturing a BiMOS device

TOSHIBA KK8 citations74
US5091322AFeb 25, 1992

Semiconductor device and method of manufacturing the same

TOSHIBA KK16 citations74
US4769337ASep 6, 1988

Method of forming selective polysilicon wiring layer to source, drain and emitter regions by implantation through polysilicon layer

TOSHIBA KK11 citations74
US5583363ADec 10, 1996

Inverter gate circuit of a bi-CMOS structure having common layers between fets and bipolar transistors

TOSHIBA KK9 citations73
US5489795AFeb 6, 1996

Semiconductor integrated circuit device having double well structure

TOSHIBA KK16 citations73
US5406115AApr 11, 1995

Semiconductor device including bipolar transistor having shallowed base and method for manufacturing the same

TOSHIBA KK8 citations73
US5597757AJan 28, 1997

Method of manufacturing a semiconductor device including bipolar and MOS transistors

TOSHIBA KK3 citations63
US5523242AJun 4, 1996

Method of manufacturing a BiMOS device

TOSHIBA KK2 citations63
US5399894AMar 21, 1995

Semiconductor device having bipolar transistor and MOS transistor

TOSHIBA KK4 citations63
US5341021AAug 23, 1994

Bipolar transistor having an electrode structure suitable for integration

TOSHIBA KK3 citations63
US5093707AMar 3, 1992

Semiconductor device with bipolar and cmos transistors

TOSHIBA KK2 citations63
US5075752ADec 24, 1991

Bi-cmos semiconductor device having memory cells formed in isolated wells

TOSHIBA KK5 citations63
US5485034AJan 16, 1996

Semiconductor device including bipolar transistor having shallowed base

TOSHIBA KK3 citations62
US5243557ASep 7, 1993

Bi-CMOS semiconductor integrated circuit

TOSHIBA KK4 citations61
US5014106AMay 7, 1991

Semiconductor device for use in a hybrid LSI circuit

TOSHIBA KK5 citations58

HITACHI LTD

8 patents

FUJI ELECTROCHEMICAL CO LTD

1 patent

KAO CORP

1 patent

ONO PHARMACEUTICAL CO

1 patent