Inventor
JAGANNATHAN PREMLATHA
US7 patents
Patents
7 patentsUS5399462AMar 21, 1995
Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane
IBM33 citations92
US5385804AJan 31, 1995
Silicon containing negative resist for DUV, I-line or E-beam lithography comprising an aromatic azide side group in the polysilsesquioxane polymer
IBM44 citations92
US5338818AAug 16, 1994
Silicon containing positive resist for DUV lithography
IBM44 citations91
US5296332AMar 22, 1994
Crosslinkable aqueous developable photoresist compositions and method for use thereof
IBM49 citations90
US6136498AOct 24, 2000
Polymer-bound sensitizer
IBM19 citations83
US6074800AJun 13, 2000
Photo acid generator compounds, photo resists, and method for improving bias
IBM16 citations81
US6383712B1May 7, 2002
Polymer-bound sensitizer
IBM3 citations62