Inventor

LEE NAEIN

KR25 patents

⚠️ This page may combine multiple inventors who share the name “LEE NAEIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEE NAEIN

SAMSUNG ELECTRONICS CO LTD

Semiconductor devices including gaps between conductive patterns

Semiconductor devices and methods of fabricating the same

Semiconductor device and method of fabricating the same

Planarized interlayer dielectric with air gap isolation

Semiconductor devices and methods of forming the same

Semiconductor devices

Semiconductor device and method of fabricating the same

Semiconductor devices having through-electrodes and methods for fabricating the same

Method of fabricating a semiconductor device

Semiconductor devices and methods of fabricating the same

Semiconductor devices and methods of fabricating the same

Semiconductor devices having staggered air gaps

Semiconductor devices and methods of fabricating the same

Semiconductor devices having staggered air gaps

Semiconductor device including transistor and method of manufacturing the same

Semiconductor device including transistor and method of manufacturing the same

Planarized interlayer dielectric with air gap isolation

Semiconductor device and method of fabricating the same

Semiconductor devices and methods of forming the same

Method of treating a porous dielectric layer and a method of fabricating a semiconductor device using the same

Semiconductor devices including multilayer source/drain stressors and methods of manufacturing the same

Method of forming semiconductor device having dielectric layer and related system

HEO JUNG SHIK

Methods of forming semiconductor devices using electrolyzed sulfuric acid (ESA)

RHA SANGHO

Semiconductor devices having staggered air gaps

LEE WOOJIN

Method of manufacturing semiconductor device using a plurality of etch stop layers