Inventor
OHKUBO WAKI
JP5 patents
Patents
5 patentsUS6153733ANov 28, 2000
(Disulfonyl diazomethane compounds)
TOKYO OHKA KOGYO CO LTD254 citations96
US6180313B1Jan 30, 2001
Poly (disulfonyl diazomethane) compound and positive-working chemical-amplification photoresist composition containing the same
TOKYO OHKA KOGYO CO LTD45 citations93
US7781144B2Aug 24, 2010
Positive resist composition and resist pattern forming method
TOKYO OHKA KOGYO CO LTD5 citations61
US7858286B2Dec 28, 2010
Positive resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations40
US7192687B2Mar 20, 2007
Positive resist composition and method of forming resist pattern using same
TOKYO OHKA KOGYO CO LTD0 citations40