Inventor
UENO SHUICHI
JP47 patents
⚠️ This page may combine multiple inventors who share the name “UENO SHUICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
21 patentsUS6461934B2Oct 8, 2002
Method of manufacturing semiconductor device having trench type element isolation regions
MITSUBISHI ELECTRIC CORP89 citations97
US6521527B1Feb 18, 2003
Semiconductor device and method of fabricating the same
MITSUBISHI ELECTRIC CORP45 citations96
US6492690B2Dec 10, 2002
Semiconductor device having control electrodes with different impurity concentrations
MITSUBISHI ELECTRIC CORP61 citations96
US6255146B1Jul 3, 2001
Thin film transistor and a method of manufacturing thereof
MITSUBISHI ELECTRIC CORP39 citations96
US5600154AFeb 4, 1997
Thin film transistor with particular nitrogen concentration
MITSUBISHI ELECTRIC CORP35 citations96
US6469347B1Oct 22, 2002
Buried-channel semiconductor device, and manufacturing method thereof
MITSUBISHI ELECTRIC CORP40 citations93
US6300664B1Oct 9, 2001
Semiconductor device and method of fabricating the same
MITSUBISHI ELECTRIC CORP33 citations93
US6300656B1Oct 9, 2001
Nonvolatile semiconductor memory device having a drain region of different impurity density and conductivity types
MITSUBISHI ELECTRIC CORP22 citations93
US6188085B1Feb 13, 2001
Thin film transistor and a method of manufacturing thereof
MITSUBISHI ELECTRIC CORP16 citations93
US6130463AOct 10, 2000
Field effect transistor and method of manufacturing same
MITSUBISHI ELECTRIC CORP16 citations93
US6017781AJan 25, 2000
Method for making a thin film transistor
MITSUBISHI ELECTRIC CORP22 citations93
US5998828ADec 7, 1999
Semiconductor device having nitrogen introduced in its polysilicon gate
MITSUBISHI ELECTRIC CORP51 citations93
US5557129ASep 17, 1996
Semiconductor MOSFET device having a shallow nitrogen implanted channel region
MITSUBISHI ELECTRIC CORP25 citations92
US6380036B1Apr 30, 2002
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP7 citations74
US6153910ANov 28, 2000
Semiconductor device with nitrogen implanted channel region
MITSUBISHI ELECTRIC CORP6 citations74
US6020610AFeb 1, 2000
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP15 citations74
US5978294ANov 2, 1999
Memory cell evaluation semiconductor device, method of fabricating the same and memory cell evaluation method
MITSUBISHI ELECTRIC CORP5 citations63
US6475844B1Nov 5, 2002
Field effect transistor and method of manufacturing same
MITSUBISHI ELECTRIC CORP0 citations52
US12210074B2Jan 28, 2025
Magnetic sensor and method for manufacturing same
MITSUBISHI ELECTRIC CORP0 citations47
US11293949B2Apr 5, 2022
Current detection apparatus and power conversion apparatus
MITSUBISHI ELECTRIC CORP0 citations47
US11204373B2Dec 21, 2021
Electric power converting apparatus
MITSUBISHI ELECTRIC CORP0 citations47
RENESAS TECH CORP
9 patentsUS6731535B1May 4, 2004
Nonvolatile semiconductor memory device
RENESAS TECH CORP167 citations99
US7157773B2Jan 2, 2007
Nonvolatile semiconductor memory device
RENESAS TECH CORP26 citations93
US7605420B2Oct 20, 2009
Semiconductor tunneling magneto resistance device and method of manufacturing the same
RENESAS TECH CORP15 citations84
US6815295B1Nov 9, 2004
Method of manufacturing field effect transistors
RENESAS TECH CORP7 citations74
US6770522B2Aug 3, 2004
Semiconductor device and manufacturing method thereof
RENESAS TECH CORP10 citations74
US7180773B2Feb 20, 2007
Magnetic memory device
RENESAS TECH CORP3 citations63
US6897523B2May 24, 2005
Semiconductor device
RENESAS TECH CORP3 citations63
US6812536B2Nov 2, 2004
MOSFET with graded gate oxide layer
RENESAS TECH CORP5 citations61
US7554837B2Jun 30, 2009
Magnetic memory device
RENESAS TECH CORP1 citations52
RENESAS ELECTRONICS CORP
4 patentsUS8013407B2Sep 6, 2011
Magnetic memory device having a recording layer
RENESAS ELECTRONICS CORP10 citations84
US7973376B2Jul 5, 2011
Semiconductor device and method of manufacturing the same
RENESAS ELECTRONICS CORP3 citations62
US7906346B2Mar 15, 2011
Method for manufacturing a magnetic memory device and magnetic memory device
RENESAS ELECTRONICS CORP2 citations61
US8383427B2Feb 26, 2013
Semiconductor device including a magnetic tunnel junction device including a laminated structure and manufacturing method therefor
RENESAS ELECTRONICS CORP1 citations52
MITSUBISHI GAS CHEMICAL CO
3 patentsUS8034962B2Oct 11, 2011
Acid anhydride ester and composition thereof, and heat-curable resin composition and cured product thereof
MITSUBISHI GAS CHEMICAL CO2 citations62
US9605110B2Mar 28, 2017
Epoxy resin curing agent
MITSUBISHI GAS CHEMICAL CO0 citations52
US7371882B2May 13, 2008
Reactor for producing a nitrile compound and method for operating the reactor
MITSUBISHI GAS CHEMICAL CO0 citations39