P

Inventor

UENO SHUICHI

JP47 patents
⚠️ This page may combine multiple inventors who share the name “UENO SHUICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MITSUBISHI ELECTRIC CORP

21 patents
US6461934B2Oct 8, 2002

Method of manufacturing semiconductor device having trench type element isolation regions

MITSUBISHI ELECTRIC CORP89 citations97
US6521527B1Feb 18, 2003

Semiconductor device and method of fabricating the same

MITSUBISHI ELECTRIC CORP45 citations96
US6492690B2Dec 10, 2002

Semiconductor device having control electrodes with different impurity concentrations

MITSUBISHI ELECTRIC CORP61 citations96
US6255146B1Jul 3, 2001

Thin film transistor and a method of manufacturing thereof

MITSUBISHI ELECTRIC CORP39 citations96
US5600154AFeb 4, 1997

Thin film transistor with particular nitrogen concentration

MITSUBISHI ELECTRIC CORP35 citations96
US6469347B1Oct 22, 2002

Buried-channel semiconductor device, and manufacturing method thereof

MITSUBISHI ELECTRIC CORP40 citations93
US6300664B1Oct 9, 2001

Semiconductor device and method of fabricating the same

MITSUBISHI ELECTRIC CORP33 citations93
US6300656B1Oct 9, 2001

Nonvolatile semiconductor memory device having a drain region of different impurity density and conductivity types

MITSUBISHI ELECTRIC CORP22 citations93
US6188085B1Feb 13, 2001

Thin film transistor and a method of manufacturing thereof

MITSUBISHI ELECTRIC CORP16 citations93
US6130463AOct 10, 2000

Field effect transistor and method of manufacturing same

MITSUBISHI ELECTRIC CORP16 citations93
US6017781AJan 25, 2000

Method for making a thin film transistor

MITSUBISHI ELECTRIC CORP22 citations93
US5998828ADec 7, 1999

Semiconductor device having nitrogen introduced in its polysilicon gate

MITSUBISHI ELECTRIC CORP51 citations93
US5557129ASep 17, 1996

Semiconductor MOSFET device having a shallow nitrogen implanted channel region

MITSUBISHI ELECTRIC CORP25 citations92
US6380036B1Apr 30, 2002

Semiconductor device and method of manufacturing the same

MITSUBISHI ELECTRIC CORP7 citations74
US6153910ANov 28, 2000

Semiconductor device with nitrogen implanted channel region

MITSUBISHI ELECTRIC CORP6 citations74
US6020610AFeb 1, 2000

Semiconductor device and method of manufacturing the same

MITSUBISHI ELECTRIC CORP15 citations74
US5978294ANov 2, 1999

Memory cell evaluation semiconductor device, method of fabricating the same and memory cell evaluation method

MITSUBISHI ELECTRIC CORP5 citations63
US6475844B1Nov 5, 2002

Field effect transistor and method of manufacturing same

MITSUBISHI ELECTRIC CORP0 citations52
US12210074B2Jan 28, 2025

Magnetic sensor and method for manufacturing same

MITSUBISHI ELECTRIC CORP0 citations47
US11293949B2Apr 5, 2022

Current detection apparatus and power conversion apparatus

MITSUBISHI ELECTRIC CORP0 citations47
US11204373B2Dec 21, 2021

Electric power converting apparatus

MITSUBISHI ELECTRIC CORP0 citations47

RENESAS TECH CORP

9 patents

RENESAS ELECTRONICS CORP

4 patents

MITSUBISHI GAS CHEMICAL CO

3 patents

NISSAN MOTOR

2 patents

SATO TAKASHI

2 patents

NIPPON STEEL CORP

1 patent

TAKENAGA TAKASHI

1 patent

FURUTA HARUO

1 patent

TANIZAKI HIROAKI

1 patent

MATSUDA RYOJI

1 patent

RENEASA TECHNOLOGY CORP

1 patent