Inventor
TONEGAWA YAMATO
JP20 patents
⚠️ This page may combine multiple inventors who share the name “TONEGAWA YAMATO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
18 patentsUS8034673B2Oct 11, 2011
Film formation method and apparatus for forming silicon-containing insulating film doped with metal
TOKYO ELECTRON LTD74 citations97
US7964516B2Jun 21, 2011
Film formation apparatus for semiconductor process and method for using same
TOKYO ELECTRON LTD9 citations84
US7179334B2Feb 20, 2007
System and method for performing semiconductor processing on substrate being processed
TOKYO ELECTRON LTD14 citations84
US7938080B2May 10, 2011
Method for using film formation apparatus
TOKYO ELECTRON LTD8 citations83
US7494943B2Feb 24, 2009
Method for using film formation apparatus
TOKYO ELECTRON LTD10 citations83
US10535501B2Jan 14, 2020
Film forming apparatus, film forming method and non-transitory storage medium
TOKYO ELECTRON LTD2 citations72
US10388511B2Aug 20, 2019
Method of forming silicon nitride film, film forming apparatus and storage medium
TOKYO ELECTRON LTD6 citations72
US11694890B2Jul 4, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD2 citations63
US12588440B2Mar 24, 2026
Substrate processing method and substrate processing apparatus for etching using oxidization
TOKYO ELECTRON LTD0 citations62
US12488991B2Dec 2, 2025
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
US11781219B2Oct 10, 2023
Processing apparatus and processing method
TOKYO ELECTRON LTD0 citations62
US12469694B2Nov 11, 2025
Film forming method
TOKYO ELECTRON LTD0 citations59
US12060640B2Aug 13, 2024
Film forming method and system
TOKYO ELECTRON LTD0 citations51
US10573514B2Feb 25, 2020
Method of forming silicon-containing film
TOKYO ELECTRON LTD0 citations51
US10217630B2Feb 26, 2019
Method of forming silicon-containing film
TOKYO ELECTRON LTD0 citations51
US12237167B2Feb 25, 2025
Deposition method
TOKYO ELECTRON LTD0 citations50
US11923177B2Mar 5, 2024
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations47
US7959737B2Jun 14, 2011
Film formation apparatus and method for using the same
TOKYO ELECTRON LTD0 citations40