Inventor
SAVANDAIAH KIRANKUMAR
IN28 patents
⚠️ This page may combine multiple inventors who share the name “SAVANDAIAH KIRANKUMAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
24 patentsUSD894137SAug 25, 2020
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC26 citations92
USD851613SJun 18, 2019
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC33 citations92
US10763090B2Sep 1, 2020
High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process
APPLIED MATERIALS INC3 citations73
US9779971B2Oct 3, 2017
Methods and apparatus for rapidly cooling a substrate
APPLIED MATERIALS INC4 citations73
US9472443B2Oct 18, 2016
Selectively groundable cover ring for substrate process chambers
APPLIED MATERIALS INC4 citations73
US9464349B2Oct 11, 2016
Adjustable process spacing, centering, and improved gas conductance
APPLIED MATERIALS INC3 citations73
US10103012B2Oct 16, 2018
One-piece process kit shield for reducing the impact of an electric field near the substrate
APPLIED MATERIALS INC3 citations72
US9960021B2May 1, 2018
Physical vapor deposition (PVD) target having low friction pads
APPLIED MATERIALS INC5 citations72
US9953812B2Apr 24, 2018
Integrated process kit for a substrate processing chamber
APPLIED MATERIALS INC2 citations72
US9909206B2Mar 6, 2018
Process kit having tall deposition ring and deposition ring clamp
APPLIED MATERIALS INC6 citations72
US9957601B2May 1, 2018
Apparatus for gas injection in a physical vapor deposition chamber
APPLIED MATERIALS INC3 citations71
US9595464B2Mar 14, 2017
Apparatus and method for reducing substrate sliding in process chambers
APPLIED MATERIALS INC2 citations71
US11049701B2Jun 29, 2021
Biased cover ring for a substrate processing system
APPLIED MATERIALS INC3 citations70
US10546733B2Jan 28, 2020
One-piece process kit shield
APPLIED MATERIALS INC4 citations67
US9978569B2May 22, 2018
Adjustable process spacing, centering, and improved gas conductance
APPLIED MATERIALS INC1 citations63
US9096926B2Aug 4, 2015
Adjustable process spacing, centering, and improved gas conductance
APPLIED MATERIALS INC3 citations63
US10312116B2Jun 4, 2019
Methods and apparatus for rapidly cooling a substrate
APPLIED MATERIALS INC1 citations62
US10648071B2May 12, 2020
Process kit having a floating shadow ring
APPLIED MATERIALS INC1 citations61
US9343274B2May 17, 2016
Process kit shield for plasma enhanced processing chamber
APPLIED MATERIALS INC2 citations61
US11189472B2Nov 30, 2021
Cathode assembly having a dual position magnetron and centrally fed coolant
APPLIED MATERIALS INC0 citations56
US10115573B2Oct 30, 2018
Apparatus for high compressive stress film deposition to improve kit life
APPLIED MATERIALS INC0 citations51
US9960023B2May 1, 2018
Methods and apparatus for nodule control in a titanium-tungsten target
APPLIED MATERIALS INC0 citations51
US10262877B2Apr 16, 2019
Apparatus and method for reducing substrate sliding in process chambers
APPLIED MATERIALS INC0 citations50
US10199204B2Feb 5, 2019
Target retaining apparatus
APPLIED MATERIALS INC0 citations46