Inventor
MINEMURA MASAHIKO
JP32 patents
⚠️ This page may combine multiple inventors who share the name “MINEMURA MASAHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
12 patentsUS5981641ANov 9, 1999
Heat conductive silicone composition, heat conductive material and heat conductive silicone grease
SHINETSU CHEMICAL CO60 citations94
US7342049B2Mar 11, 2008
Dilatant fluid composition
SHINETSU CHEMICAL CO7 citations74
US5557000ASep 17, 1996
Silicone oil for low temperature use
SHINETSU CHEMICAL CO17 citations74
US5489482AFeb 6, 1996
Film forming composition
SHINETSU CHEMICAL CO17 citations74
US5391314AFeb 21, 1995
Electroviscous fluid composition comprising a silicone oil, synthetic fluorinated oil and an addition polymer
SHINETSU CHEMICAL CO11 citations74
US9163121B2Oct 20, 2015
Polycarbonate and polysiloxane block copolymer and flame retardant resin composition
SHINETSU CHEMICAL CO2 citations63
US5192458AMar 9, 1993
Silicone grease composition including an organomolybdenum compound
SHINETSU CHEMICAL CO2 citations63
US12024614B2Jul 2, 2024
Rubber compounding ingredient and rubber composition
SHINETSU CHEMICAL CO0 citations62
US6942820B2Sep 13, 2005
Dimethylpolysiloxane composition
SHINETSU CHEMICAL CO6 citations61
US12180369B2Dec 31, 2024
Rubber composition and organosilicon compound
SHINETSU CHEMICAL CO0 citations60
US6878200B2Apr 12, 2005
Mortar or concrete composition
SHINETSU CHEMICAL CO5 citations59
US12054588B2Aug 6, 2024
Organopolysiloxane compound, method for producing same, and antistatic agent and curable composition, each of which contains same
SHINETSU CHEMICAL CO0 citations52
FUJITSU LTD
5 patentsUS6507944B1Jan 14, 2003
Data processing method and apparatus, reticle mask, exposing method and apparatus, and recording medium
FUJITSU LTD18 citations92
US7039889B2May 2, 2006
Apparatus, method, and program for designing a mask and method for fabricating semiconductor devices
FUJITSU LTD11 citations82
US7303845B2Dec 4, 2007
Method and system for efficiently verifying optical proximity correction
FUJITSU LTD9 citations71
US6444483B1Sep 3, 2002
Method and apparatus of producing partial-area mask data files
FUJITSU LTD9 citations71
US6635392B2Oct 21, 2003
Data processing apparatus, method and program product for compensating for photo proximity effect with reduced data amount, and photomask fabricated using same
FUJITSU LTD5 citations62
TAKATA CORP
2 patentsISHIDA JUNYA
2 patentsUS8394183B2Mar 12, 2013
Asymmetric membrane and air-conditioning system using the same
ISHIDA JUNYA8 citations78
US8394181B2Mar 12, 2013
Selectively permeable material, method for producing selectively permeable membrane structure, selectively permeable membrane structure, and air conditioning system
ISHIDA JUNYA2 citations59