Method and system for efficiently verifying optical proximity correction

Abstract

A method of verifying optical proximity correction includes the steps of generating first mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction to the first mask pattern data, generating second mask pattern data from the design data under second condition, generating second corrected pattern data by applying optical proximity correction to the second mask pattern data, and comparing the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match.

What is claimed is: 
     
       1. A method of verifying optical proximity correction, comprising:
 generating first mask pattern data from design data under a first condition; 
 generating first corrected pattern data by applying an optical proximity correction, specified by predetermined correction rules, to the first mask pattern data; 
 generating second mask pattern data from said design data under a second condition; 
 generating second corrected pattern data by applying an optical proximity correction, specified by correction rules the same as the predetermined correction rules, to the second mask pattern data; and 
 comparing the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match. 
 
     
     
       2. The method as claimed in  claim 1 , further comprising modifying the optical proximity correction in response to a mismatch between the first corrected pattern data and the second corrected pattern data. 
     
     
       3. The method as claimed in  claim 1 , wherein the step generating first mask pattern data generates the first mask pattern data without rotating the design data, and the generating second mask pattern data generates the second mask pattern data by rotating the design data by a predetermined angle in a predetermined direction, and wherein the generating second corrected pattern data generates the second corrected pattern data by rotating the second mask pattern data by the predetermined angle in a direction opposite the predetermined direction after the optical proximity correction is applied to the second mask pattern data. 
     
     
       4. The method as claimed in  claim 3 , wherein the predetermined angle is an integer multiple of 90 degrees. 
     
     
       5. The method as claimed in  claim 1 , wherein the generating first mask pattern data generates the first mask pattern data by dividing the design data into first predetermined areas, and the generating second mask pattern data generates the second mask pattern data by dividing the design data into second predetermined areas different from the first predetermined areas. 
     
     
       6. The method as claimed in  claim 1 , wherein the generating first mask pattern data defines the first predetermined areas by a first process grid, and the generating second mask pattern data defines the second predetermined areas by a second process grid different from the first process grid. 
     
     
       7. The method as claimed in  claim 1 , wherein the generating first mask pattern data generates the first mask pattern data by dividing the design data into predetermined areas without rotating the design data, and the generating second mask pattern data generates the second mask pattern data by rotating the design data by a predetermined angle in a predetermined direction and by dividing the rotated design data into the predetermined areas, and wherein the generating second corrected pattern data generates the second corrected pattern data by rotating the second mask pattern data by the predetermined angle in a direction opposite the predetermined direction after the optical proximity correction is applied to the second mask pattern data. 
     
     
       8. The method as claimed in  claim 7 , wherein the predetermined angle is an integer multiple of 90 degrees. 
     
     
       9. A record medium having a program embodied therein for reading by a computer and causing the computer to verify optical proximity correction, by:
 generating first mask pattern data from design data under a first condition; 
 generating first corrected pattern data by applying an optical proximity correction, specified by predetermined correction rules, to the first mask pattern data; 
 generating second mask pattern data from said design data under a second condition; 
 generating second corrected pattern data by applying an optical proximity correction, specified by correction rules the same as the predetermined correction rules, to the second mask pattern data; and 
 comparing the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match. 
 
     
     
       10. A system for verifying optical proximity correction, comprising:
 a unit configured to generate first mask pattern data from design data under a first condition; 
 a unit configured to generate first corrected pattern data by applying an optical proximity correction, specified by predetermined correction rules, to the first mask pattern data; 
 a unit configured to generate second mask pattern data from said design data under a second condition; 
 a unit configured to generate second corrected pattern data by applying an optical proximity correction, specified by correction rules the same as the predetermined correction rules to the second mask pattern data; and 
 a unit configured to compare the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match.