Inventor

GELATOS AVGERINOS V

US66 patents

⚠️ This page may combine multiple inventors who share the name “GELATOS AVGERINOS V”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GELATOS AVGERINOS V

APPLIED MATERIALS INC

Methods for depositing tungsten layers employing atomic layer deposition techniques

Ruthenium as an underlayer for tungsten film deposition

Vapor deposition of tungsten materials

Apparatus for cyclical deposition of thin films

Method of enabling seamless cobalt gap-fill

Cobalt removal for chamber clean or pre-clean process

Methods for depositing fluorine/carbon-free conformal tungsten

Methods for depositing fluorine/carbon-free conformal tungsten

Ruthenium or cobalt as an underlayer for tungsten film deposition

High temperature tungsten metallization process

Deposition and densification process for titanium nitride barrier layers

Methods of treating nitride films

Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high K at channel

Methods for thermally forming a selective cobalt layer

Method of enabling seamless cobalt gap-fill

Integrated platform for fabricating n-type metal oxide semiconductor (NMOS) devices

Processing system and method of forming a contact

Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity

Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity

Methods for selective deposition of metal silicides via atomic layer deposition cycles

Process kit for a substrate support

Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high k at channel

Deposition and densification process for titanium nitride barrier layers

Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition

Method of depositing metal films

Methods for depositing fluorine/carbon-free conformal tungsten

Apparatuses and methods of protecting nickel and nickel containing components with thin films

Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition

Methods for depositing fluorine/carbon-free conformal tungsten

Process kit for a substrate support

Multi-step pre-clean for selective metal gap fill

Multi-step pre-clean for selective metal gap fill

Plasma treatment of film for impurity removal

Lower edge ring of a process kit for semiconductor substrate processing

Lower edge ring of a process kit for semiconductor substrate processing

Method for forming a metal gapfill

Atomic layer deposition of molybdenum silicide thin films

Methods for selective molybdenum deposition

Low-k and tantalum nitride barrier recovery using a soak process

MOTOROLA INC

Process for forming copper interconnect structure

Copper interconnect structure and method of formation

Semiconductor device having a ternary boron nitride film and a method for forming the same

Method for polish planarizing a semiconductor substrate by using a boron nitride polish stop

Method for forming metallization in an integrated circuit

KHANDELWAL AMIT

Atomic layer deposition of tungsten materials

Atomic layer deposition of tungsten materials

ZOPE BHUSHAN N

Method of enabling seamless cobalt gap-fill

APPLIED MATERIAL INC

High temperature tungsten metallization process

TZU GWO-CHUAN

Methods and apparatus for thermal based substrate processing with variable temperature capability

THAKUR RANDHIR P S

Apparatus for cyclical depositing of thin films