Inventor

FU XINYU

US51 patents

⚠️ This page may combine multiple inventors who share the name “FU XINYU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FU XINYU

APPLIED MATERIALS INC

Methods of depositing metal films using metal oxyhalide precursors

Water vapor passivation of a wall facing a plasma

Method of enabling seamless cobalt gap-fill

Methods for depositing fluorine/carbon-free conformal tungsten

Methods for depositing fluorine/carbon-free conformal tungsten

Atomic layer deposition methods for metal gate electrodes

Method for removing native oxide and associated residue from a substrate

Post deposition treatments for CVD cobalt films

Remote plasma source for pre-treatment of substrates prior to deposition

Apparatus and a method for cleaning a dielectric film

Method for forming metal interconnects and reducing metal seed layer overhang

Remote plasma pre-clean with low hydrogen pressure

Multi-step process for forming a metal barrier in a sputter reactor

Methods for thermally forming a selective cobalt layer

Method of enabling seamless cobalt gap-fill

Integrated platform for fabricating n-type metal oxide semiconductor (NMOS) devices

Methods for manufacturing metal gates

Methods for selective deposition of metal silicides via atomic layer deposition cycles

Methods for forming low-resistance contacts through integrated process flow systems

Methods for etching via atomic layer deposition (ALD) cycles

Methods of forming a layer for barrier applications in an interconnect structure

Deposition of N-metal films comprising aluminum alloys

Method for improving electromigration lifetime of copper interconnection by extended post anneal

Methods for reducing damage to substrate layers in deposition processes

Split magnet ring on a magnetron sputter chamber

Methods for depositing fluorine/carbon-free conformal tungsten

Methods for depositing fluorine/carbon-free conformal tungsten

Process kit shield for improved particle reduction

Method of enabling seamless cobalt gap-fill

Methods of depositing metal films using metal oxyhalide precursors

Method of enabling seamless cobalt gap-fill

Tungsten films by organometallic or silane pre-treatment of substrate

Methods for annealing a contact metal layer to form a metal silicidation layer

FU XINYU

Plasma treatment of substrates prior to deposition

Methods for forming a contact metal layer in semiconductor devices

Method for segregating the alloying elements and reducing the residue resistivity of copper alloy layers

Methods of forming a layer for barrier applications in an interconnect structure

ANTICANCER INC

Nude mouse model for neoplastic disease

Nude mouse model for human neoplastic disease

Nude mouse model for human neoplastic disease

ZHENG BO

Method for removing native oxide and associated residue from a substrate

Method for removing native oxide and associated residue from a substrate

ZOPE BHUSHAN N

Method of enabling seamless cobalt gap-fill

LEI YU

Post deposition treatments for CVD cobalt films

GUNG TZA-JING

Electromagnet array in a sputter reactor

ZOOMLION HEAVY INDUSTRY SCIENCE AND TECH CO LTD

Pump truck boom control method, pump truck boom control system and pump truck

RASHEED MUHAMMAD

Process kit shield for improved particle reduction

YU JICK M

Methods for forming layers on a substrate

SUBRAMANI ANANTHA K

Method for metal deposition using hydrogen plasma

LEI JIANXIN

Methods for forming a metal gate structure on a substrate