Inventor

WISE RICHARD

US60 patents

⚠️ This page may combine multiple inventors who share the name “WISE RICHARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WISE RICHARD

LAM RES CORP

Tin oxide thin film spacers in semiconductor device manufacturing

Tin oxide films in semiconductor device manufacturing

Eliminating yield impact of stochastics in lithography

Tin oxide thin film spacers in semiconductor device manufacturing

Eliminating yield impact of stochastics in lithography

Tin oxide films in semiconductor device manufacturing

Etching substrates using ale and selective deposition

Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework

Tin oxide thin film spacers in semiconductor device manufacturing

Tin oxide films in semiconductor device manufacturing

Tin oxide thin film spacers in semiconductor device manufacturing

Layout pattern proximity correction through edge placement error prediction

Integrated dry processes for patterning radiation photoresist patterning

Tin oxide mandrels in patterning

Integrated dry processes for patterning radiation photoresist patterning

Etching substrates using ALE and selective deposition

Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework

ALE smoothness: in and outside semiconductor industry

Low roughness EUV lithography

Tin oxide films in semiconductor device manufacturing

Tin oxide films in semiconductor device manufacturing

Tin oxide thin film spacers in semiconductor device manufacturing

Tin oxide mandrels in patterning

Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement

Chamfer-less via integration scheme

Low roughness EUV lithography

Ale smoothness: in and outside semiconductor industry

Eliminating yield impact of stochastics in lithography

IBM

Silicon nitride etching methods

Method to controllably form notched polysilicon gate structures

Anisotropic nitride etch process with high selectivity to oxide and photoresist layers in a damascene etch scheme

Hard mask integrated etch process for patterning of silicon oxide and other dielectric materials

Method and structure for forming trench DRAM with asymmetric strap

CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials

Multiple exposure process for formation of dense rectangular arrays

Method of forming gate stack and structure thereof

Process for fabricating a semiconductor structure having a self-aligned spacer

Method for non-selective shallow trench isolation reactive ion etch for patterning hybrid-oriented devices compatible with high-performance highly-integrated logic devices

Semiconductor device structure having low and high performance devices of same conductive type on same substrate

Three dimensional integration and methods of through silicon via creation

Method of improving etch uniformity in deep silicon etching

FAROOQ MUKTA G

Three dimensional integration and methods of through silicon via creation

Three dimensional integration and methods of through silicon via creation

Three dimensional integration and methods of through silicon via creation

Three dimensional integration with through silicon vias having multiple diameters

CHEN TZE-CHIANG

CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials

CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials

(unassigned)

Continuous corona discharge ozone generation device

TOKYO ELECTRON LTD

Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current

SBH INC

Resealable beverage can lid