Inventor
CHEN KAI-HSIUNG
TW24 patents
⚠️ This page may combine multiple inventors who share the name “CHEN KAI-HSIUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
19 patentsUS10031426B2Jul 24, 2018
Method and system for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US10281827B2May 7, 2019
Noise reduction for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations82
US11294293B2Apr 5, 2022
Overlay marks for reducing effect of bottom layer asymmetry
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10983005B2Apr 20, 2021
Spectroscopic overlay metrology
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations73
US9766554B2Sep 19, 2017
Method and apparatus for estimating focus and dose of an exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10866524B2Dec 15, 2020
Method and system for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10514612B2Dec 24, 2019
Method and system for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9418199B2Aug 16, 2016
Method and apparatus for extracting systematic defects
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US10684556B2Jun 16, 2020
Noise reduction for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US12554206B2Feb 17, 2026
Overlay marks for reducing effect of bottom layer asymmetry
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11726413B2Aug 15, 2023
Overlay marks for reducing effect of bottom layer asymmetry
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11656391B2May 23, 2023
Aperture design and methods thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11513444B2Nov 29, 2022
Noise reduction for overlay control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10461037B2Oct 29, 2019
Method for forming semiconductor device structure with overlay grating
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations58
US10663633B2May 26, 2020
Aperture design and methods thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10867933B2Dec 15, 2020
Method for forming semiconductor device structure with overlay grating
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
US10734325B2Aug 4, 2020
Method for forming semiconductor device structure with overlay grating
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
US10204867B1Feb 12, 2019
Semiconductor metrology target and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations46
US9690212B2Jun 27, 2017
Hybrid focus-exposure matrix
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations41
TAIWAN SEMICONDUCTOR MFG
5 patentsUS7301603B2Nov 27, 2007
Exposure system and method
TAIWAN SEMICONDUCTOR MFG35 citations90
US9053284B2Jun 9, 2015
Method and system for overlay control
TAIWAN SEMICONDUCTOR MFG8 citations83
US7004814B2Feb 28, 2006
CMP process control method
TAIWAN SEMICONDUCTOR MFG11 citations82
US9070622B2Jun 30, 2015
Systems and methods for similarity-based semiconductor process control
TAIWAN SEMICONDUCTOR MFG4 citations70
US8984450B2Mar 17, 2015
Method and apparatus for extracting systematic defects
TAIWAN SEMICONDUCTOR MFG5 citations69