Inventor · disambiguated record
Adrianne K. Tipton
Also filed as: TIPTON ADRIANNE · TIPTON ADRIANNE K · TIPTON ADRIANNE KAY
18 granted patents·2 pending applications·2,955 citations·filing 2002–2020
97Inventor score
Top patents by PatentIndex Score
20 records- 0198US7790633B1Sequential deposition/anneal film densification methodNOVELLUS SYSTEMS INC·Filed 2006·Granted Sep 7, 2010·643 cites·23 claims
- 0298US7482247B1Conformal nanolaminate dielectric deposition and etch bag gap fill processNOVELLUS SYSTEMS INC·Filed 2006·Granted Jan 27, 2009·583 cites·27 claims
- 0398US7208389B1Method of porogen removal from porous low-k films using UV radiationNOVELLUS SYSTEMS INC·Filed 2003·Granted Apr 24, 2007·602 cites·38 claims
- 0498US7148155B1Sequential deposition/anneal film densification methodNOVELLUS SYSTEMS INC·Filed 2004·Granted Dec 12, 2006·416 cites·34 claims
- 0596US6848455B1Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing speciesNOVELLUS SYSTEMS INC·Filed 2002·Granted Feb 1, 2005·113 cites·28 claims
- 0694US6764552B1Supercritical solutions for cleaning photoresist and post-etch residue from low-k materialsNOVELLUS SYSTEMS INC·Filed 2002·Granted Jul 20, 2004·149 cites·25 claims
- 0793US7297608B1Method for controlling properties of conformal silica nanolaminates formed by rapid vapor depositionNOVELLUS SYSTEMS INC·Filed 2004·Granted Nov 20, 2007·68 cites·32 claims
- 0893US6867152B1Properties of a silica thin film produced by a rapid vapor deposition (RVD) processNOVELLUS SYSTEMS INC·Filed 2003·Granted Mar 15, 2005·83 cites·31 claims
- 0991US6800142B1Method for removing photoresist and post-etch residue using activated peroxide followed by supercritical fluid treatmentNOVELLUS SYSTEMS INC·Filed 2002·Granted Oct 5, 2004·57 cites·46 claims
- 1091US6715498B1Method and apparatus for radiation enhanced supercritical fluid processingNOVELLUS SYSTEMS INC·Filed 2002·Granted Apr 6, 2004·58 cites·18 claims
- 1190US7202185B1Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layerNOVELLUS SYSTEMS INC·Filed 2004·Granted Apr 10, 2007·48 cites·37 claims
- 1289US7097878B1Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 filmsNOVELLUS SYSTEMS INC·Filed 2004·Granted Aug 29, 2006·35 cites·19 claims
- 1382US7129189B1Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD)NOVELLUS SYSTEMS INC·Filed 2004·Granted Oct 31, 2006·26 cites·26 claims
- 1481US7271112B1Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometryNOVELLUS SYSTEMS INC·Filed 2004·Granted Sep 18, 2007·25 cites·17 claims
- 1577US7294583B1Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 filmsNOVELLUS SYSTEMS INC·Filed 2004·Granted Nov 13, 2007·18 cites·23 claims
- 1675US6905556B1Method and apparatus for using surfactants in supercritical fluid processing of wafersNOVELLUS SYSTEMS INC·Filed 2002·Granted Jun 14, 2005·19 cites·12 claims
- 1771US7223707B1Dynamic rapid vapor deposition process for conformal silica laminatesNOVELLUS SYSTEMS INC·Filed 2004·Granted May 29, 2007·10 cites·36 claims
- 1857US7700155B1Method and apparatus for modulation of precursor exposure during a pulsed deposition processNOVELLUS SYSTEMS INC·Filed 2004·Granted Apr 20, 2010·2 cites·19 claims
- 1956US2010173074A1Method and apparatus for modulation of precursor exposure during a pulsed deposition processNOVELLUS SYSTEMS INC·Filed 2010·Application pending·0 cites
- 2049US2021188487A1Tamper evident delivery bag and method thereforHILEX POLY CO LLC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →