Inventor · disambiguated record
Ahmad D. Katnani
Also filed as: KATNANI AHMAD · KATNANI AHMAD D · KATNANI AHMAD DAUOD
32 granted patents·1 pending application·1,253 citations·filing 1991–2018
98Inventor score
Files withIBM28SHIPLEY CO LLC2GLOBALFOUNDRIES INC1IBM CORP OF ARMONK1INTERNAT BUSINESS MACHINES MAC1
Top patents by PatentIndex Score
33 records- 0198US6087064ASilsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic methodIBM·Filed 1998·Granted Jul 11, 2000·234 cites·34 claims
- 0294US6210856B1Resist composition and process of forming a patterned resist layer on a substrateIBM·Filed 1999·Granted Apr 3, 2001·123 cites·26 claims
- 0392US6344305B1Radiation sensitive silicon-containing resistsIBM·Filed 2000·Granted Feb 5, 2002·42 cites·11 claims
- 0489US6114082AFrequency doubling hybrid photoresist having negative and positive tone components and method of preparing the sameIBM·Filed 1996·Granted Sep 5, 2000·81 cites·21 claims
- 0587US6365321B1Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulationsIBM·Filed 1999·Granted Apr 2, 2002·62 cites·69 claims
- 0686US6340734B1Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic methodIBM·Filed 1999·Granted Jan 22, 2002·73 cites·7 claims
- 0785US5609989AAcid scavengers for use in chemically amplified photoresistsIBM·Filed 1995·Granted Mar 11, 1997·47 cites·11 claims
- 0884US6187505B1Radiation sensitive silicon-containing resistsIBM·Filed 1999·Granted Feb 13, 2001·46 cites·17 claims
- 0984US6043003AE-beam application to mask making using new improved KRS resist systemIBM·Filed 1999·Granted Mar 28, 2000·45 cites·19 claims
- 1083US5955222AMethod of making a rim-type phase-shift mask and mask manufactured therebyIBM·Filed 1996·Granted Sep 21, 1999·51 cites·26 claims
- 1183US5296332ACrosslinkable aqueous developable photoresist compositions and method for use thereofIBM·Filed 1991·Granted Mar 22, 1994·49 cites·24 claims
- 1279US6037097AE-beam application to mask making using new improved KRS resist systemIBM·Filed 1998·Granted Mar 14, 2000·50 cites·35 claims
- 1378US6440635B1Low “K” factor hybrid photoresistIBM·Filed 2000·Granted Aug 27, 2002·16 cites·8 claims
- 1477US7856341B2Heat sinkIBM·Filed 2008·Granted Dec 21, 2010·11 cites·23 claims
- 1575US8030157B1Liner protection in deep trench etchingIBM·Filed 2010·Granted Oct 4, 2011·4 cites·8 claims
- 1673US6300035B1Chemically amplified positive photoresistsSHIPLEY CO LLC·Filed 1998·Granted Oct 9, 2001·28 cites·20 claims
- 1772US6245492B1Photoresist system and process for aerial image enhancementIBM·Filed 1998·Granted Jun 12, 2001·32 cites·20 claims
- 1870US6372406B1Deactivated aromatic amines as additives in acid-catalyzed resistsIBM·Filed 2000·Granted Apr 16, 2002·10 cites·6 claims
- 1970US5919597AMethods for preparing photoresist compositionsIBM CORP OF ARMONK·Filed 1997·Granted Jul 6, 1999·34 cites·28 claims
- 2068US6200726B1Optimization of space width for hybrid photoresistIBM·Filed 1998·Granted Mar 13, 2001·33 cites·19 claims
- 2166US6190829B1Low “K” factor hybrid photoresistIBM·Filed 1996·Granted Feb 20, 2001·24 cites·10 claims
- 2265US6284439B1Method of producing an integrated circuit chip using low “k” factor hybrid photoresist and apparatus formed therebyIBM·Filed 1998·Granted Sep 4, 2001·24 cites·12 claims
- 2364US6313492B1Integrated circuit chip produced by using frequency doubling hybrid photoresistIBM·Filed 1998·Granted Nov 6, 2001·22 cites·12 claims
- 2464US6103447AApproach to formulating irradiation sensitive positive resistsIBM·Filed 1998·Granted Aug 15, 2000·25 cites·27 claims
- 2562US5667938AAcid scavengers for use in chemically amplified photoresistsIBM·Filed 1996·Granted Sep 16, 1997·15 cites·6 claims
- 2658US6303263B1Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groupsINTERNAT BUSINESS MACHINES MAC·Filed 1998·Granted Oct 16, 2001·24 cites·24 claims
- 2757US6372412B1Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed therebyIBM·Filed 1998·Granted Apr 16, 2002·16 cites·13 claims
- 2856US5733705AAcid Scavengers for use in chemically amplified photoresistsIBM·Filed 1996·Granted Mar 31, 1998·13 cites·7 claims
- 2948US6140015APhotoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branchingIBM·Filed 1998·Granted Oct 31, 2000·9 cites·17 claims
- 3047US6265134B1Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branchingIBM·Filed 2000·Granted Jul 24, 2001·1 cites·13 claims
- 3145US10566446B2Mitigation of hot carrier damage in field-effect transistorsGLOBALFOUNDRIES INC·Filed 2018·Granted Feb 18, 2020·0 cites·16 claims
- 3243US6268436B1Approach to formulating irradiation sensitive positive resistsIBM·Filed 1999·Granted Jul 31, 2001·9 cites·6 claims
- 3335US2002012869A1Positive photoresists containing crosslinked polymersSHIPLEY CO LLC·Filed 2001·Application pending·0 cites
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