Inventor · disambiguated record
Akshay Dhanakshirur
Also filed as: DHANAKSHIRUR AKSHAY
6 granted patents·7 pending applications·1 citations·filing 2019–2025
66Inventor score
Files withAPPLIED MATERIALS INC13
Top patents by PatentIndex Score
13 records- 0185US11959174B2Shunt door for magnets in plasma process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Apr 16, 2024·1 cites·20 claims
- 0277US2025346999A1Shaped showerhead for edge plasma modulationAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0376US2024271284A1Shunt door for magnets in plasma process chamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0467US12338530B2Shaped showerhead for edge plasma modulationAPPLIED MATERIALS INC·Filed 2021·Granted Jun 24, 2025·0 cites·16 claims
- 0563US12460298B2Showerhead design to control stray depositionAPPLIED MATERIALS INC·Filed 2021·Granted Nov 4, 2025·0 cites·18 claims
- 0663US2025279265A1Small cell reactors with shared foreline and pressure conduitAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0761US2025037976A1Process stack for cvd plasma treatmentAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0859US2025277307A13d printed integrated gas mixerAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 0954US11984302B2Magnetic-material shield around plasma chambers near pedestalAPPLIED MATERIALS INC·Filed 2020·Granted May 14, 2024·0 cites·16 claims
- 1054US11929278B2Low impedance current path for edge non-uniformity tuningAPPLIED MATERIALS INC·Filed 2021·Granted Mar 12, 2024·0 cites·17 claims
- 1154US11869795B2Mesa height modulation for thickness correctionAPPLIED MATERIALS INC·Filed 2021·Granted Jan 9, 2024·0 cites·17 claims
- 1249US2019309418A1Multizone rotatable diffuser apparatusAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1341US2022093368A1Wafer non-uniformity tweaking through localized ion enhanced plasma (iep)APPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →