Inventor · disambiguated record
Akiyoshi Goto
Also filed as: GOTO AKIYOSHI
43 granted patents·64 pending applications·78 citations·filing 2009–2025
96Inventor score
Top patents by PatentIndex Score
107 records- 0193US8025833B2Curable composition for nanoimprint, and patterning methodFUJIFILM CORP·Filed 2009·Granted Sep 27, 2011·21 cites·41 claims
- 0292US10802399B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Granted Oct 13, 2020·5 cites·20 claims
- 0392US9250519B2Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the methodFUJIFILM CORP·Filed 2014·Granted Feb 2, 2016·8 cites·20 claims
- 0488US12044967B2Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Jul 23, 2024·2 cites·12 claims
- 0587US8506853B2Composition for optical materialsWADA KENJI·Filed 2010·Granted Aug 13, 2013·5 cites·20 claims
- 0686US12038689B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Granted Jul 16, 2024·1 cites·22 claims
- 0786US12032288B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Granted Jul 9, 2024·1 cites·7 claims
- 0886US9551931B2Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic deviceFUJIFILM CORP·Filed 2015·Granted Jan 24, 2017·5 cites·11 claims
- 0985US10859914B2Pattern forming method, method for producing electronic device, and actinic ray-sensitive or radiation-sensitive resin composition for organic solvent developmentFUJIFILM CORP·Filed 2017·Granted Dec 8, 2020·3 cites·9 claims
- 1084US9996003B2Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Jun 12, 2018·4 cites·19 claims
- 1183US8778235B2Colorant multimer, colored curable composition, color filter and method for producing the same, and solid-state image sensor, image display device, liquid crystal display device and organic EL display with the color filterITO JUNICHI·Filed 2010·Granted Jul 15, 2014·7 cites·12 claims
- 1282US11067890B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Granted Jul 20, 2021·2 cites·12 claims
- 1380US10261417B2Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film and pattern forming method, each using composition, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2016·Granted Apr 16, 2019·3 cites·23 claims
- 1480US2025370343A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 1579US2025347997A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 1677US11281103B2Composition for forming upper layer film, pattern forming method, resist pattern, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Mar 22, 2022·2 cites·13 claims
- 1776US10018913B2Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Jul 10, 2018·2 cites·17 claims
- 1875US10025186B2Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Jul 17, 2018·2 cites·12 claims
- 1974US9405197B2Pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Aug 2, 2016·2 cites·18 claims
- 2072US10175578B2Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2017·Granted Jan 8, 2019·1 cites·15 claims
- 2172US2025244670A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 2270US10303058B2Pattern forming method, treating agent, electronic device, and method for manufacturing the sameFUJIFILM CORP·Filed 2016·Granted May 28, 2019·1 cites·8 claims
- 2369US2024402601A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, and compoundFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 2469US2025164884A1Method for producing active ray-sensitive or radiation-sensitive resin composition, method for producing onium salt compound for active ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for producing electronic device, and onium salt compositionFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 2569US2025321480A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for producing electronic device, and onium saltsFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 2669US2024337931A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, and compoundsFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 2769US2024419072A1Active light ray sensitive or radioactive ray sensitive resin composition, resist film, pattern-forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 2868US2024419071A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, compound, and resinFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 2967US2024329524A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 3066US9116426B2Dye compound, method of producing dipyrromethene metal complex compound, method of producing dye multimer, substituted pyrrole compound, colored curable composition, color filter, method of producing color filter, solid-state image sensor and liquid crystal display deviceFUJIFILM CORP·Filed 2013·Granted Aug 25, 2015·1 cites·17 claims
- 3166US2025199404A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 3266US2024248398A1Actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, resin, and method for manufacturing resinFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 3366US2024427242A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 3466US2022382153A1Positive tone resist composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 3565US12001140B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Granted Jun 4, 2024·0 cites·20 claims
- 3665US2024176242A1Pattern forming method, method for producing electronic device, actinic ray-sensitive or radiation-sensitive resin composition, and resist filmFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 3765US2024192598A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 3864US2024004293A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 3964US2024061331A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and compoundFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 4064US2024219831A1Pattern forming method and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 4163US11150557B2Pattern forming method, method for manufacturing electronic device, monomer for producing resin for semiconductor device manufacturing process, resin, method for producing resin, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive filmFUJIFILM CORP·Filed 2018·Granted Oct 19, 2021·0 cites·13 claims
- 4263US2023004086A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 4363US2023400769A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 4462US2023043143A1Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 4562US2025291250A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 4662US2023168581A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 4761US12007688B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resinFUJIFILM CORP·Filed 2020·Granted Jun 11, 2024·0 cites·20 claims
- 4861US2023185192A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 4960US2021271162A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 5060US2023221640A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
Showing the top 50 of 107 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →