Inventor · disambiguated record
Akiou Kikuchi
Also filed as: KIKUCHI AKIOU
18 granted patents·14 pending applications·28 citations·filing 2008–2025
89Inventor score
Top patents by PatentIndex Score
32 records- 0188US10156012B2Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and a non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2017·Granted Dec 18, 2018·3 cites·15 claims
- 0288US9017571B2Dry etching agent and dry etching methodUMEZAKI TOMONORI·Filed 2011·Granted Apr 28, 2015·12 cites·20 claims
- 0386US9728422B2Dry etching methodCENTRAL GLASS CO LTD·Filed 2016·Granted Aug 8, 2017·5 cites·10 claims
- 0480US10153153B2Method for removing adhering matter and dry etching methodCENTRAL GLASS CO LTD·Filed 2017·Granted Dec 11, 2018·3 cites·21 claims
- 0570US9238872B2Method for synthesizing fluorine compound by electrolysis and electrode thereforMORI ISAMU·Filed 2012·Granted Jan 19, 2016·1 cites·4 claims
- 0670US2025285874A1Surface treatment method, dry etching method, cleaning method, semiconductor device manufacturing method, and etching deviceCENTRAL GLASS CO LTD·Filed 2025·Application pending·0 cites
- 0768US12417922B2Surface treatment method, dry etching method, cleaning method, semiconductor device manufacturing method, and etching deviceCENTRAL GLASS CO LTD·Filed 2022·Granted Sep 16, 2025·0 cites·15 claims
- 0868US9524877B2Silicon dry etching methodCENTRAL GLASS CO LTD·Filed 2014·Granted Dec 20, 2016·2 cites·8 claims
- 0963US9852914B2Sacrificial-film removal method and substrate processing deviceSCREEN HOLDINGS CO LTD·Filed 2014·Granted Dec 26, 2017·1 cites·4 claims
- 1062US9082725B2Pattern forming methodKIMURA MASAHIRO·Filed 2012·Granted Jul 14, 2015·1 cites·8 claims
- 1159US12378659B2Metal material, method of producing metal material, method of passivating semiconductor processing apparatus, method of manufacturing semiconductor device, and method of manufacturing filled containerCENTRAL GLASS CO LTD·Filed 2020·Granted Aug 5, 2025·0 cites·11 claims
- 1258US2025372392A1Dry-etching method for silicon oxide layerSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 1357US9676626B2IF7-derived iodine fluoride compound recovery method and recovery deviceCENTRAL GLASS CO LTD·Filed 2014·Granted Jun 13, 2017·0 cites·9 claims
- 1456US2025232983A1Etching method, method for producing semiconductor device, etching apparatus and etching gasCENTRAL GLASS CO LTD·Filed 2023·Application pending·0 cites
- 1555US12145857B2Method for producing tungsten hexafluorideCENTRAL GLASS CO LTD·Filed 2019·Granted Nov 19, 2024·0 cites·20 claims
- 1655US9230821B2Dry etching agent and dry etching method using the sameCENTRAL GLASS CO LTD·Filed 2014·Granted Jan 5, 2016·0 cites·11 claims
- 1755US8105566B2Method for producing oxygen-containing halogenated fluorideMORI ISAMU·Filed 2009·Granted Jan 31, 2012·0 cites·1 claims
- 1854US2024254074A1Method for purifying trialkylamine, trialkylamine production method and compositionCENTRAL GLASS CO LTD·Filed 2021·Application pending·0 cites
- 1954US2016002574A1Cleaning Gas and Cleaning MethodCENTRAL GLASS CO LTD·Filed 2014·Application pending·0 cites
- 2054US2025391668A1Dry etching method, cleaning method, and manufacturing method for semiconductor deviceCENTRAL GLASS CO LTD·Filed 2023·Application pending·0 cites
- 2153US2024368755A1Method for removing molybdenum monofluoride to molybdenum pentafluoride and method for producing semiconductor deviceCENTRAL GLASS CO LTD·Filed 2022·Application pending·0 cites
- 2252US2011150747A1Method for Manufacturing Oxygen-Containing Halogenated FluorideCENTRAL GLASS CO LTD·Filed 2009·Application pending·0 cites
- 2348US2010247412A1Method for Removal of CIO3FCENTRAL GLASS CO LTD·Filed 2008·Application pending·0 cites
- 2446US9708720B2Gas generation deviceCENTRAL GLASS CO LTD·Filed 2012·Granted Jul 18, 2017·0 cites·2 claims
- 2545US9093388B2Dry etching agent and dry etching method using the sameHIBINO YASUO·Filed 2011·Granted Jul 28, 2015·0 cites·7 claims
- 2642US2020247685A1Tungsten Hexafluoride Production MethodCENTRAL GLASS CO LTD·Filed 2018·Application pending·0 cites
- 2741US8864961B2Fluorine gas generating apparatusKIKUCHI AKIOU·Filed 2010·Granted Oct 21, 2014·0 cites·4 claims
- 2841US2014352716A1Dry etching method, dry etching apparatus, metal film, and device including the metal filmCENTRAL GLASS CO LTD·Filed 2014·Application pending·0 cites
- 2940US9097688B2Method and device for measuring water content in hydrogen fluoride-containing fluoride salt compoundsKIKUCHI AKIOU·Filed 2011·Granted Aug 4, 2015·0 cites·6 claims
- 3038US2018212131A1Thermoelectric conversion material and method for producing sameCENTRAL GLASS CO LTD·Filed 2018·Application pending·0 cites
- 3134US2014302683A1Dry etching agentKIKUCHI AKIOU·Filed 2012·Application pending·0 cites
- 3231US2012006487A1System for In-Situ Mixing and Diluting Fluorine GasKIKUCHI AKIOU·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Akiou Kikuchi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →