Inventor · disambiguated record
Akemi Moniwa
Also filed as: MONIWA AKEMI
13 granted patents·1 pending application·211 citations·filing 1995–2013
90Inventor score
Top patents by PatentIndex Score
14 records- 0192US6964832B2Semiconductor device and manufacturing method thereofHITACHI LTD·Filed 2003·Granted Nov 15, 2005·61 cites·11 claims
- 0288US5895741APhotomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design systemHITACHI LTD·Filed 1997·Granted Apr 20, 1999·59 cites·27 claims
- 0383US6787459B2Method for fabricating a semiconductor deviceRENESAS TECH CORP·Filed 2002·Granted Sep 7, 2004·33 cites·16 claims
- 0481US5700601APhotomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design systemHITACHI LTD·Filed 1995·Granted Dec 23, 1997·40 cites·22 claims
- 0578US6586341B2Method of manufacturing semiconductor deviceHITACHI LTD·Filed 2002·Granted Jul 1, 2003·16 cites·24 claims
- 0663US7682760B2Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type maskRENESAS TECH CORP·Filed 2006·Granted Mar 23, 2010·1 cites·8 claims
- 0757US8119308B2Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomaskMINAMIDE AYUMI·Filed 2009·Granted Feb 21, 2012·1 cites·20 claims
- 0853US8367309B2Pattern formation method using levenson-type mask and method of manufacturing levenson-type maskRENESAS ELECTRONICS CORP·Filed 2011·Granted Feb 5, 2013·0 cites·4 claims
- 0952US8835083B2Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2013·Granted Sep 16, 2014·0 cites·4 claims
- 1050US7935462B2Pattern formation method using levenson-type mask and method of manufacturing levenson-type maskRENESAS ELECTRONICS CORP·Filed 2010·Granted May 3, 2011·0 cites·6 claims
- 1147US8563200B2Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor deviceMINAMIDE AYUMI·Filed 2012·Granted Oct 22, 2013·0 cites·5 claims
- 1246US8071264B2Pattern formation method using levenson-type mask and method of manufacturing levenson-type maskOKUNO MITSURU·Filed 2011·Granted Dec 6, 2011·0 cites·4 claims
- 1345US2009061362A1Semiconductor device manufacturing method using double patterning and maskRENESAS TECH CORP·Filed 2008·Application pending·0 cites
- 1438US8426087B2Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout methodMINAMIDE AYUMI·Filed 2011·Granted Apr 23, 2013·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →