Inventor · disambiguated record
Akira Yonemizu
Also filed as: YONEMIZU AKIRA
20 granted patents·3 pending applications·897 citations·filing 1994–2012
96Inventor score
Technology areasH10P
Top patents by PatentIndex Score
23 records- 0196US5518542ADouble-sided substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 1994·Granted May 21, 1996·265 cites·23 claims
- 0293US5964954ADouble-sided substrate cleaning apparatus and cleaning method using the sameTOKYO ELECTRON LTD·Filed 1997·Granted Oct 12, 1999·119 cites·4 claims
- 0387US6096233AMethod for wet etching of thin filmTOKYO ELECTRON LTD·Filed 1997·Granted Aug 1, 2000·96 cites·22 claims
- 0486US5651160ACleaning apparatus for cleaning substratesTOKYO ELECTRON LTD·Filed 1996·Granted Jul 29, 1997·73 cites·14 claims
- 0577US5858112AMethod for cleaning substratesTOKYO ELECTRON LTD·Filed 1997·Granted Jan 12, 1999·46 cites·17 claims
- 0677US5636401ACleaning apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 1995·Granted Jun 10, 1997·47 cites·28 claims
- 0776US5685039ACleaning apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Nov 11, 1997·51 cites·20 claims
- 0871US5686143AResist treating methodTOKYO ELECTRON LTD·Filed 1996·Granted Nov 11, 1997·31 cites·6 claims
- 0969US5975097AProcessing apparatus for target processing substrateTOKYO ELECTRON LTD·Filed 1997·Granted Nov 2, 1999·36 cites·18 claims
- 1061US6936134B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2001·Granted Aug 30, 2005·9 cites·15 claims
- 1160US6491760B2Scrub washing methodTOKYO ELECTRON LTD·Filed 2001·Granted Dec 10, 2002·6 cites·5 claims
- 1258US6261365B1Heat treatment method, heat treatment apparatus and treatment systemTOKYO ELECTRON LTD·Filed 1999·Granted Jul 17, 2001·19 cites·14 claims
- 1356US6979474B2Heat treatment method, heat treatment apparatus and treatment systemTOKYO ELECTRON LTD·Filed 2001·Granted Dec 27, 2005·4 cites·15 claims
- 1454US6292972B1Scrub washing apparatus and scrub washing methodTOKYO ELECTRON LTD·Filed 1999·Granted Sep 25, 2001·17 cites·11 claims
- 1554US5958145AMethod for washing both surfaces of a substrateTOKYO ELECTRON LTD·Filed 1998·Granted Sep 28, 1999·16 cites·12 claims
- 1651US6178580B1Processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jan 30, 2001·17 cites·16 claims
- 1751US6173468B1Apparatus for washing both surfaces of a substrateTOKYO ELECTRON LTD·Filed 1999·Granted Jan 16, 2001·14 cites·7 claims
- 1849US5985039AApparatus and method for washing both surfaces of a substrateTOKYO ELECTRON LTD·Filed 1998·Granted Nov 16, 1999·15 cites·16 claims
- 1943US6652662B1Substrate surface processing apparatus and methodTOKYO ELECTRON LTD·Filed 1999·Granted Nov 25, 2003·10 cites·18 claims
- 2043US2007125491A1Method of removing particle on substrate, apparatus therefor, and coating and development apparatusTOKYO ELECTON LTD·Filed 2006·Application pending·0 cites
- 2138US5882426AMethod of cleaning a substrate by scrubbingTOKYO ELECTRON LTD·Filed 1997·Granted Mar 16, 1999·6 cites·5 claims
- 2235US2014014643A1Heating DeviceAKIBA HIRONORI·Filed 2012·Application pending·0 cites
- 2335US2014014644A1Heating DeviceAKIBA HIRONORI·Filed 2012·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Akira Yonemizu files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →