Inventor · disambiguated record
Alfred Chalupka
Also filed as: CHALUPKA ALFRED
17 granted patents·3 pending applications·2,000 citations·filing 1988–2007
95Inventor score
Files withIMS IONEN MIKROFAB SYST11IMS NANOFABRICATION GMBH4IMS IONEN MIKROFABRATIONS SYST1IMS IONEN MIKROPFABRIKATIONS S1IMS MIKROFABRIKATIONS SYSTEME1
Top patents by PatentIndex Score
20 records- 0198US7388217B2Particle-optical projection systemIMS NANOFABRICATION GMBH·Filed 2007·Granted Jun 17, 2008·1.5k cites·9 claims
- 0297US6768125B2Maskless particle-beam system for exposing a pattern on a substrateIMS NANOFABRICATION GMBH·Filed 2003·Granted Jul 27, 2004·186 cites·21 claims
- 0393US7084411B2Pattern-definition device for maskless particle-beam exposure apparatusIMS NANOFABRICATION GMBH·Filed 2004·Granted Aug 1, 2006·90 cites·19 claims
- 0488US4916322AArrangement for stabilizing an irradiated maskOESTERR INVESTITIONSKREDIT·Filed 1988·Granted Apr 10, 1990·53 cites·26 claims
- 0575US6472673B1Lithographic method for producing an exposure pattern on a substrateIMS IONEN MIKROFAB SYST·Filed 1999·Granted Oct 29, 2002·32 cites·13 claims
- 0669US5350924AIon-optical imaging systemIMS IONEN MIKROFAB SYST·Filed 1992·Granted Sep 27, 1994·21 cites·12 claims
- 0764US6661015B2Pattern lock systemIMS IONEN MIKROFAB SYST·Filed 2001·Granted Dec 9, 2003·6 cites·11 claims
- 0863US6326632B1Particle-optical imaging system for lithography purposesIMS IONEN MIKROFAB SYST·Filed 1999·Granted Dec 4, 2001·23 cites·7 claims
- 0963US5742062AArrangement for masked beam lithography by means of electrically charged particlesIMS MIKROFABRIKATIONS SYSTEME·Filed 1996·Granted Apr 21, 1998·20 cites·40 claims
- 1060US6194730B1Electrostatic lensIMS IONEN MIKROFAB SYST·Filed 1998·Granted Feb 27, 2001·14 cites·10 claims
- 1160US5801388AParticle beam, in particular ionic optic imaging systemIMS IONEN MIKROPFABRIKATIONS S·Filed 1995·Granted Sep 1, 1998·17 cites·11 claims
- 1260US5378917AParticle-beam imaging systemIMS IONEN MIKROFABRATIONS SYST·Filed 1993·Granted Jan 3, 1995·17 cites·15 claims
- 1359US5876880AProcess for producing a structured maskIMS IONEN MIKROFAB SYST·Filed 1995·Granted Mar 2, 1999·19 cites·29 claims
- 1454US5317161AIon sourceIMS IONEN MIKROFAB SYST·Filed 1992·Granted May 31, 1994·13 cites·16 claims
- 1553US5436460AIon-optical imaging systemIMS IONEN MIKROFAB SYST·Filed 1993·Granted Jul 25, 1995·11 cites·10 claims
- 1651US2005201246A1Particle-optical projection systemIMS NANOFABRICATION GMBH·Filed 2005·Application pending·0 cites
- 1750US5874739AArrangement for shadow-casting lithographyIMS IONEN MIKROFAB SYST·Filed 1997·Granted Feb 23, 1999·9 cites·12 claims
- 1841US5693950AProjection system for charged particlesIMS IONEN MIKROFAB SYST·Filed 1995·Granted Dec 2, 1997·5 cites·12 claims
- 1934US2001036588A1Lithographic imaging of a structure pattern onto one or more fields on a substrateIMS IONEN MIKROFAB SYST·Filed 2001·Application pending·0 cites
- 2033US2002148976A1Thermal control of image pattern distortionsFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →