Inventor · disambiguated record
Alec Dorfner
Also filed as: DORFNER ALEC
2 granted patents·9 pending applications·0 citations·filing 2022–2024
25Inventor score
Files withTOKYO ELECTRON LTD11
Top patents by PatentIndex Score
11 records- 0164US12512329B2Multi level contact etchTOKYO ELECTRON LTD·Filed 2023·Granted Dec 30, 2025·0 cites·20 claims
- 0252US12463048B2Methods for forming semiconductor devices using metal hard masksTOKYO ELECTRON LTD·Filed 2022·Granted Nov 4, 2025·0 cites·20 claims
- 0350US2024347346A1Semiconductor devices and methods of manufacturing the sameTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0450US2025293019A1Etch stop layer in all-in-one harc etchTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0550US2025293042A1Harc etch chemistry for seminconductorsTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0650US2025293041A1Cyclic etch/deposition plasma processes using tungsten based precursor gasTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0749US2025191929A1Layer by layer etch processTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0848US2024234157A9Polymer Removal via Multiple Flash Steps during Plasma EtchTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0945US2025239457A1Tungsten-based additive for through-substrate etchingTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1043US2025311246A1Vertically stacked capacitors and method of forming the sameTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1142US2025259855A1In-situ metal deposition for reduced charging during dielectric etchTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →