Inventor · disambiguated record
Alexander D. Lantsman
Also filed as: LANTSMAN ALEXANDER D
10 granted patents·2 pending applications·653 citations·filing 1993–2017
93Inventor score
Top patents by PatentIndex Score
12 records- 0194US5948215AMethod and apparatus for ionized sputteringTOKYO ELECTRON LTD·Filed 1997·Granted Sep 7, 1999·105 cites·23 claims
- 0293US5830330AMethod and apparatus for low pressure sputteringTOKYO ELECTRON LTD·Filed 1997·Granted Nov 3, 1998·133 cites·12 claims
- 0392US5800688AApparatus for ionized sputteringTOKYO ELECTRON LTD·Filed 1997·Granted Sep 1, 1998·89 cites·11 claims
- 0492US5569363AInductively coupled plasma sputter chamber with conductive material sputtering capabilitiesSONY CORP·Filed 1994·Granted Oct 29, 1996·84 cites·27 claims
- 0590US5573597APlasma processing system with reduced particle contaminationSONY CORP·Filed 1995·Granted Nov 12, 1996·70 cites·26 claims
- 0686US6447655B2DC plasma power supply for a sputter depositionFiled 2001·Granted Sep 10, 2002·33 cites·20 claims
- 0785US5589041APlasma sputter etching system with reduced particle contaminationSONY CORP·Filed 1995·Granted Dec 31, 1996·51 cites·22 claims
- 0884US5584972APlasma noise and arcing suppressor apparatus and method for sputter depositionSONY CORP·Filed 1995·Granted Dec 17, 1996·48 cites·16 claims
- 0968US6190512B1Soft plasma ignition in plasma processing chambersTOKYO ELECTRON ARIZONA INC·Filed 1993·Granted Feb 20, 2001·23 cites·7 claims
- 1053US6475353B1Apparatus and method for sputter depositing dielectric films on a substrateTOKYO ELECTRON LTD·Filed 1997·Granted Nov 5, 2002·17 cites·14 claims
- 1150US2019050788A1Techniques for pre-scheduled dispatching non-electronic correspondence on behalf of a senderLANTSMAN ALEXANDER D·Filed 2017·Application pending·0 cites
- 1248US2018101920A1Protection of rights of bequeathers and beneficiariesLANTSMAN ALEXANDER D·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →