Inventor · disambiguated record
Alexandre Likhanskii
Also filed as: LIKHANSKII ALEXANDRE
44 granted patents·10 pending applications·120 citations·filing 2007–2024
97Inventor score
Files withAPPLIED MATERIALS INC29VARIAN SEMICONDUCTOR EQUIPMENT ASS INC23BOEING CO1VARIAN SEMICONDUCTOR EQUIPMENT1
Top patents by PatentIndex Score
54 records- 0197US11127557B1Ion source with single-slot tubular cathodeAPPLIED MATERIALS INC·Filed 2020·Granted Sep 21, 2021·5 cites·20 claims
- 0296US9230773B1Ion beam uniformity controlVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Jan 5, 2016·20 cites·11 claims
- 0394US9685298B1Apparatus and method for contamination control in ion beam apparatusVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Jun 20, 2017·13 cites·20 claims
- 0492US10192727B2Electrodynamic mass analysisVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jan 29, 2019·8 cites·19 claims
- 0590US11587778B2Electrodynamic mass analysis with RF biased ion sourceAPPLIED MATERIALS INC·Filed 2020·Granted Feb 21, 2023·2 cites·16 claims
- 0690US9721750B2Controlling contamination particle trajectory from a beam-line electrostatic elementVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Aug 1, 2017·6 cites·19 claims
- 0789US10068758B2Ion mass separation using RF extractionVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Sep 4, 2018·5 cites·17 claims
- 0889US9761410B2Apparatus and method for in-situ cleaning in ion beam apparatusVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Sep 12, 2017·5 cites·20 claims
- 0989US9478399B2Multi-aperture extraction system for angled ion beamVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Oct 25, 2016·5 cites·20 claims
- 1088US12249488B2Plasma shaper to control ion flux distribution of plasma sourceAPPLIED MATERIALS INC·Filed 2022·Granted Mar 11, 2025·1 cites·10 claims
- 1185US10665415B1Apparatus and method for controlling ion beam properties using electrostatic filterAPPLIED MATERIALS INC·Filed 2018·Granted May 26, 2020·3 cites·19 claims
- 1285US10665433B2Extreme edge uniformity controlVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted May 26, 2020·3 cites·16 claims
- 1384US10522330B2In-situ plasma cleaning of process chamber componentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Dec 31, 2019·3 cites·8 claims
- 1484US10504682B2Conductive beam optic containing internal heating elementVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Dec 10, 2019·3 cites·18 claims
- 1583US7744039B2Systems and methods for controlling flows with electrical pulsesBOEING CO·Filed 2007·Granted Jun 29, 2010·21 cites·30 claims
- 1681US10923306B2Ion source with biased extraction plateAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·2 cites·18 claims
- 1781US10763072B1Apparatus, system and techniques for mass analyzed ion beamAPPLIED MATERIALS INC·Filed 2019·Granted Sep 1, 2020·2 cites·19 claims
- 1881US10224181B2Radio frequency extraction system for charge neutralized ion beamVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Mar 5, 2019·3 cites·13 claims
- 1979US9922795B2High brightness ion beam extraction using bias electrodes and magnets proximate the extraction apertureVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Mar 20, 2018·2 cites·18 claims
- 2077US10410844B2RF clean system for electrostatic elementsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Sep 10, 2019·2 cites·10 claims
- 2175USD1051838SSingle-slot tubular cathodeAPPLIED MATERIALS INC·Filed 2021·Granted Nov 19, 2024·0 cites·1 claims
- 2274US11631567B2Ion source with single-slot tubular cathodeAPPLIED MATERIALS INC·Filed 2021·Granted Apr 18, 2023·0 cites·18 claims
- 2374US9613777B2Uniformity control using adjustable internal antennasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Apr 4, 2017·2 cites·19 claims
- 2471US10714301B1Conductive beam optics for reducing particles in ion implanterVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Jul 14, 2020·1 cites·18 claims
- 2570US11495434B2In-situ plasma cleaning of process chamber componentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2020·Granted Nov 8, 2022·0 cites·12 claims
- 2667US2021159043A1Apparatus and method for controlling ion beam using electostatic filterAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2766US11574800B2Extreme edge uniformity controlVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2020·Granted Feb 7, 2023·0 cites·6 claims
- 2865US12154753B2Device to control uniformity of extracted ion beamAPPLIED MATERIALS INC·Filed 2021·Granted Nov 26, 2024·0 cites·14 claims
- 2965US11810746B2Variable thickness ion source extraction plateAPPLIED MATERIALS INC·Filed 2021·Granted Nov 7, 2023·0 cites·28 claims
- 3065US11037758B2In-situ plasma cleaning of process chamber componentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2019·Granted Jun 15, 2021·0 cites·16 claims
- 3164US12125680B2Ion extraction assembly having variable electrode thickness for beam uniformity controlAPPLIED MATERIALS INC·Filed 2021·Granted Oct 22, 2024·0 cites·18 claims
- 3264US11600473B2Ion source with biased extraction plateAPPLIED MATERIALS INC·Filed 2021·Granted Mar 7, 2023·0 cites·20 claims
- 3362US10937624B2Apparatus and method for controlling ion beam using electrostatic filterAPPLIED MATERIALS INC·Filed 2018·Granted Mar 2, 2021·0 cites·19 claims
- 3460US2025246414A1Systems and methods for high-throughput angled ion processingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3559US11651932B1Mismatched optics for angular control of extracted ion beamAPPLIED MATERIALS INC·Filed 2021·Granted May 16, 2023·0 cites·20 claims
- 3659US2025285843A1Systems and methods for high-throughput angled ion processingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3758US10290462B2High brightness ion beam extraction using bias electrodes and magnets proximate the extraction apertureVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted May 14, 2019·0 cites·22 claims
- 3858US2025218742A1Rf blocker for uniformity controlAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3956US10790116B2Electostatic filter and method for controlling ion beam using electostatic filterAPPLIED MATERIALS INC·Filed 2018·Granted Sep 29, 2020·0 cites·20 claims
- 4056US9520259B2Ion beam uniformity controlVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Dec 13, 2016·0 cites·17 claims
- 4156US2024339287A1Apparatus, system and techniques for mass analyzed ion beamAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4255US10886098B2Electrostatic filter and ion implanter having asymmetric electrostatic configurationAPPLIED MATERIALS INC·Filed 2018·Granted Jan 5, 2021·0 cites·19 claims
- 4353US10804068B2Electostatic filter and method for controlling ion beam properties using electrostatic filterAPPLIED MATERIALS INC·Filed 2018·Granted Oct 13, 2020·0 cites·20 claims
- 4453US2024371602A1Heated Plasma Flood Gun SweeperAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4552US11437215B2Electrostatic filter providing reduced particle generationAPPLIED MATERIALS INC·Filed 2019·Granted Sep 6, 2022·0 cites·19 claims
- 4652US11011343B2High-current ion implanter and method for controlling ion beam using high-current ion implanterAPPLIED MATERIALS INC·Filed 2019·Granted May 18, 2021·0 cites·20 claims
- 4752US2023083497A1Uniform plasma linear ion sourceAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 4850US10074514B1Apparatus and method for improved ion beam currentVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Sep 11, 2018·0 cites·20 claims
- 4946US11791126B2Apparatus for directional processingAPPLIED MATERIALS INC·Filed 2019·Granted Oct 17, 2023·0 cites·17 claims
- 5046USD956005SShaped electrodeAPPLIED MATERIALS INC·Filed 2019·Granted Jun 28, 2022·3 cites·1 claims
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →