Inventor · disambiguated record
Andrew Weeks Kueny
Also filed as: KUENY ANDREW · KUENY ANDREW W · KUENY ANDREW WEEKS
14 granted patents·6 pending applications·495 citations·filing 1998–2023
93Inventor score
Top patents by PatentIndex Score
20 records- 0198US6991514B1Optical closed-loop control system for a CMP apparatus and method of manufacture thereofVERITY INSTR INC·Filed 2003·Granted Jan 31, 2006·174 cites·42 claims
- 0295US7339682B2Heterodyne reflectometer for film thickness monitoring and method for implementingVERITY INSTR INC·Filed 2005·Granted Mar 4, 2008·47 cites·62 claims
- 0391US8125633B2Calibration of a radiometric optical monitoring system used for fault detection and process monitoringWHELAN MIKE·Filed 2008·Granted Feb 28, 2012·38 cites·48 claims
- 0491US6052188ASpectroscopic ellipsometerVERITY INSTR INC·Filed 1998·Granted Apr 18, 2000·134 cites·23 claims
- 0588US9997325B2Electron beam exciter for use in chemical analysis in processing systemsHOSCH JIMMY W·Filed 2009·Granted Jun 12, 2018·24 cites·9 claims
- 0683US10365212B2System and method for calibration of optical signals in semiconductor process systemsVERITY INSTR INC·Filed 2017·Granted Jul 30, 2019·5 cites·27 claims
- 0779US7049156B2System and method for in-situ monitor and control of film thickness and trench depthVERITY INSTR INC·Filed 2003·Granted May 23, 2006·24 cites·42 claims
- 0876US6642063B2Apparatus for characterization of microelectronic feature qualityLAM RES CORP·Filed 2002·Granted Nov 4, 2003·16 cites·29 claims
- 0970US12174071B2System, apparatus, and method for improved background correction and calibration of optical devicesVERITY INSTR INC·Filed 2023·Granted Dec 24, 2024·0 cites·25 claims
- 1067US9383323B2Workpiece characterization systemMELONI MARK ANTHONY·Filed 2011·Granted Jul 5, 2016·2 cites·20 claims
- 1166US6432729B1Method for characterization of microelectronic feature qualityLAM RES CORP·Filed 1999·Granted Aug 13, 2002·28 cites·7 claims
- 1257US2024019305A1System and method for fault detection and operational readiness for optical instruments for semiconductor processesVERITY INSTR INC·Filed 2023·Application pending·0 cites
- 1357US2024019302A1Very high resolution spectrometer for monitoring of semiconductor processesVERITY INSTR INC·Filed 2023·Application pending·0 cites
- 1451US9386241B2Apparatus and method for enhancing dynamic range of charge coupled device-based spectrographKUENY ANDREW WEEKS·Filed 2003·Granted Jul 5, 2016·3 cites·25 claims
- 1548US2016131587A1Method and Apparatus for Monitoring Pulsed Plasma ProcessesVERITY INSTR INC·Filed 2014·Application pending·0 cites
- 1647US10861755B2System and method for measurement of complex structuresVERITY INSTR INC·Filed 2018·Granted Dec 8, 2020·0 cites·20 claims
- 1737US2012120387A1Workpiece Characterization SystemMELONI MARK ANTHONY·Filed 2011·Application pending·0 cites
- 1836US2013016344A1Method and Apparatus for Measuring Process Parameters of a Plasma Etch ProcessBULLOCK LARRY·Filed 2011·Application pending·0 cites
- 1934US2006012796A1Plasma treatment apparatus and light detection method of a plasma treatmentSAITO SUSUMU·Filed 2004·Application pending·0 cites
- 2032US9772226B2Referenced and stabilized optical measurement systemCORLESS JOHN DOUGLAS·Filed 2011·Granted Sep 26, 2017·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →