Inventor · disambiguated record
Anjana M. Patel
Also filed as: PATEL ANJANA M
11 granted patents·1 pending application·776 citations·filing 2003–2023
89Inventor score
Top patents by PatentIndex Score
12 records- 0198US7967913B2Remote plasma clean process with cycled high and low pressure clean stepsAPPLIED MATERIALS INC·Filed 2009·Granted Jun 28, 2011·477 cites·19 claims
- 0296US8445078B2Low temperature silicon oxide conversionLIANG JINGMEI·Filed 2011·Granted May 21, 2013·19 cites·11 claims
- 0396US7628897B2Reactive ion etching for semiconductor device feature topography modificationAPPLIED MATERIALS INC·Filed 2003·Granted Dec 8, 2009·230 cites·28 claims
- 0495US7935643B2Stress management for tensile filmsAPPLIED MATERIALS INC·Filed 2009·Granted May 3, 2011·48 cites·9 claims
- 0575US2023151487A1Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0674US10903066B2Heater support kit for bevel etch chamberAPPLIED MATERIALS INC·Filed 2019·Granted Jan 26, 2021·1 cites·20 claims
- 0768US11560623B2Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·0 cites·16 claims
- 0868US9589773B2In-situ etch rate determination for chamber clean endpointAPPLIED MATERIALS INC·Filed 2016·Granted Mar 7, 2017·1 cites·20 claims
- 0967US11948790B2Heater support kit for bevel etch chamberAPPLIED MATERIALS INC·Filed 2020·Granted Apr 2, 2024·0 cites·20 claims
- 1064US11699577B2Treatment for high-temperature cleansAPPLIED MATERIALS INC·Filed 2021·Granted Jul 11, 2023·0 cites·20 claims
- 1154US12488981B2Systems and methods for deposition residue controlAPPLIED MATERIALS INC·Filed 2020·Granted Dec 2, 2025·0 cites·7 claims
- 1239US10755903B2RPS defect reduction by cyclic clean induced RPS coolingAPPLIED MATERIALS INC·Filed 2017·Granted Aug 25, 2020·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →