Inventor · disambiguated record
Anagnostis Tsiatmas
Also filed as: TSIATMAS ANAGNOSTIS
31 granted patents·4 pending applications·74 citations·filing 2013–2024
96Inventor score
Top patents by PatentIndex Score
35 records- 0198US11784098B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Oct 10, 2023·3 cites·21 claims
- 0298US11145557B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Oct 12, 2021·5 cites·23 claims
- 0396US10615084B2Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic valuesASML NETHERLANDS BV·Filed 2017·Granted Apr 7, 2020·9 cites·34 claims
- 0496US10488768B2Beat patterns for alignment on small metrology targetsASML NETHERLANDS BV·Filed 2018·Granted Nov 26, 2019·10 cites·20 claims
- 0596US10453758B2Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portionASML NETHERLANDS BV·Filed 2017·Granted Oct 22, 2019·9 cites·29 claims
- 0695US11947269B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Apr 2, 2024·2 cites·20 claims
- 0795US10546790B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Jan 28, 2020·7 cites·36 claims
- 0891US10782617B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2018·Granted Sep 22, 2020·4 cites·20 claims
- 0990US10811323B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2017·Granted Oct 20, 2020·4 cites·21 claims
- 1089US11101184B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·2 cites·18 claims
- 1188US12322660B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2023·Granted Jun 3, 2025·0 cites·20 claims
- 1287US12142535B2Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetryASML NETHERLANDS BV·Filed 2017·Granted Nov 12, 2024·2 cites·22 claims
- 1387US10983445B2Method and apparatus for measuring a parameter of interest using image plane detection techniquesASML NETHERLANDS BV·Filed 2019·Granted Apr 20, 2021·3 cites·20 claims
- 1486US12468235B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2024·Granted Nov 11, 2025·0 cites·20 claims
- 1586US10795269B2Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Oct 6, 2020·3 cites·15 claims
- 1683US10481503B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2016·Granted Nov 19, 2019·2 cites·16 claims
- 1782US11143972B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2018·Granted Oct 12, 2021·1 cites·21 claims
- 1882US10747122B2Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Aug 18, 2020·2 cites·20 claims
- 1980US11728224B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2021·Granted Aug 15, 2023·0 cites·20 claims
- 2075US11710668B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
- 2175US8780677B2Magnetic field generatorUNIV SOUTHAMPTON·Filed 2013·Granted Jul 15, 2014·5 cites·20 claims
- 2274US11101185B2Method and apparatus to determine a patterning process parameterASML NETHERLANDS BV·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 2372US10677589B2Substrate, metrology apparatus and associated methods for a lithographic processASML NETHERLANDS BV·Filed 2018·Granted Jun 9, 2020·1 cites·20 claims
- 2466US11604419B2Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targetsASML NETHERLANDS BV·Filed 2021·Granted Mar 14, 2023·0 cites·20 claims
- 2566US2025118528A1Charged particle assessment system and methodASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 2665US11092900B2Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the methodASML NETHERLANDS BV·Filed 2019·Granted Aug 17, 2021·0 cites·20 claims
- 2764US10871367B2Substrate, metrology apparatus and associated methods for a lithographic processASML NETHERLANDS BV·Filed 2020·Granted Dec 22, 2020·0 cites·20 claims
- 2862US12124174B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2020·Granted Oct 22, 2024·0 cites·20 claims
- 2958US2025299293A1Obtaining high resolution information from low resolution imagesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3056US11022897B2Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targetsASML NETHERLANDS BV·Filed 2018·Granted Jun 1, 2021·0 cites·20 claims
- 3154US2025224685A1Method for determining a measurement recipe and associated apparatusesASMLNETHERLANDS B V·Filed 2022·Application pending·0 cites
- 3251US10571363B2Method of determining an optimal focus height for a metrology apparatusASML NETHERLANDS BV·Filed 2019·Granted Feb 25, 2020·0 cites·20 claims
- 3346US10585354B2Method of optimizing a metrology processASML NETHERLANDS BV·Filed 2019·Granted Mar 10, 2020·0 cites·20 claims
- 3444US10585048B2Method of determining a value of a parameter of interest of a target formed by a patterning processASML NETHERLANDS BV·Filed 2019·Granted Mar 10, 2020·0 cites·21 claims
- 3543US2022082944A1Method for metrology optimizationASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →