Inventor · disambiguated record
Andrew J. Watts
Also filed as: WATTS ANDREW · WATTS ANDREW J
16 granted patents·3 pending applications·278 citations·filing 1988–2019
93Inventor score
Top patents by PatentIndex Score
19 records- 0196US5126006APlural level chip maskingIBM·Filed 1991·Granted Jun 30, 1992·133 cites·35 claims
- 0286US5213916AMethod of making a gray level maskIBM·Filed 1990·Granted May 25, 1993·45 cites·25 claims
- 0377US5334467AGray level maskIBM·Filed 1993·Granted Aug 2, 1994·27 cites·5 claims
- 0474US6557163B1Method of photolithographic critical dimension control by using reticle measurements in a control algorithmIBM·Filed 2001·Granted Apr 29, 2003·14 cites·20 claims
- 0572US7745069B2Structure and methodology for fabrication and inspection of photomasksIBM·Filed 2007·Granted Jun 29, 2010·2 cites·26 claims
- 0671US7200257B2Structure and methodology for fabrication and inspection of photomasksIBM·Filed 2005·Granted Apr 3, 2007·2 cites·8 claims
- 0767US8181009B2VLAN tagging over IPSec tunnelsWATTS ANDREW·Filed 2009·Granted May 15, 2012·6 cites·25 claims
- 0862US4838323AMisfuelling prevention device and methodSHELL OIL CO·Filed 1988·Granted Jun 13, 1989·31 cites·16 claims
- 0961US7294440B2Method to selectively correct critical dimension errors in the semiconductor industryIBM·Filed 2004·Granted Nov 13, 2007·6 cites·30 claims
- 1061US6338921B1Mask with linewidth compensation and method of making sameIBM·Filed 2000·Granted Jan 15, 2002·6 cites·52 claims
- 1154US2008093342A1Etching apparatus for semicondutor fabricationDALTON TIMOTHY J·Filed 2007·Application pending·0 cites
- 1251US8423918B2Structure and methodology for fabrication and inspection of photomasks by a single design systemRANKIN JED H·Filed 2010·Granted Apr 16, 2013·0 cites·20 claims
- 1349US2006191638A1Etching apparatus for semiconductor fabricationIBM·Filed 2005·Application pending·0 cites
- 1445US11438376B2Problematic autonomous system routing detectionT MOBILE USA INC·Filed 2019·Granted Sep 6, 2022·0 cites·20 claims
- 1544US7211356B2Method of patterning a substrate by feeding mask defect data forward for subsequent correctionIBM·Filed 2005·Granted May 1, 2007·0 cites·18 claims
- 1642US7110195B2Monolithic hard pellicleIBM·Filed 2004·Granted Sep 19, 2006·1 cites·28 claims
- 1740US2020186458A1Autonomous system route validation via blockchainT MOBILE USA INC·Filed 2018·Application pending·0 cites
- 1838US7276316B2Common second level frame exposure methods for making embedded attenuated phase shift masksIBM·Filed 2004·Granted Oct 2, 2007·0 cites·17 claims
- 1938US6387596B2Method of forming resist images by periodic pattern removalIBM·Filed 1999·Granted May 14, 2002·5 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →