Inventor · disambiguated record
Arun A. Aiyer
Also filed as: AIYER ARUN A · AIYER ARUN ANATH
11 granted patents·316 citations·filing 1994–2022
91Inventor score
Files withNIKON RES CORP OF AMERICA4AIYER ARUN ANATH3NIKON PRECISION INC3NIKON RESEARCH CORP OF AMERICA1
Top patents by PatentIndex Score
11 records- 0194US5453814AIllumination source and method for microlithographyNIKON PRECISION INC·Filed 1994·Granted Sep 26, 1995·110 cites·33 claims
- 0283US6248000B1Polishing pad thinning to optically access a semiconductor wafer surfaceNIKON RES CORP OF AMERICA·Filed 1998·Granted Jun 19, 2001·72 cites·17 claims
- 0379US6261152B1Heterdoyne Thickness Monitoring SystemNIKON RES CORP OF AMERICA·Filed 1998·Granted Jul 17, 2001·49 cites·34 claims
- 0465US6302770B1In-situ pad conditioning for CMP polisherNIKON RES CORP OF AMERICA·Filed 1998·Granted Oct 16, 2001·23 cites·18 claims
- 0564US5729343AFilm thickness measurement apparatus with tilting stage and method of operationNIKON PRECISION INC·Filed 1996·Granted Mar 17, 1998·27 cites·29 claims
- 0661US11442025B1Optical sensor for surface inspection and metrologyAIYER ARUN ANATH·Filed 2022·Granted Sep 13, 2022·0 cites·30 claims
- 0761US6733370B2In-situ pad conditioning apparatus for CMP polisherNIKON RES CORP OF AMERICA·Filed 2001·Granted May 11, 2004·8 cites·29 claims
- 0860US11703461B2Optical sensor for surface inspection and metrologyAIYER ARUN ANATH·Filed 2022·Granted Jul 18, 2023·0 cites·10 claims
- 0958US5698069ATechnique for detecting particles on a wafer support surfaceNIKON PRECISION INC·Filed 1996·Granted Dec 16, 1997·20 cites·28 claims
- 1052US11561080B2Optical sensor for surface inspection and metrologyAIYER ARUN ANATH·Filed 2022·Granted Jan 24, 2023·0 cites·7 claims
- 1132US5936254AThin film detection method and apparatusNIKON RESEARCH CORP OF AMERICA·Filed 1997·Granted Aug 10, 1999·7 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →