Inventor · disambiguated record
Arthur Hotzel
Also filed as: HOTZEL ARTHUR
13 granted patents·19 citations·filing 2010–2016
87Inventor score
Top patents by PatentIndex Score
13 records- 0185US8551677B2Lithographic CD correction by second exposureHOTZEL ARTHUR·Filed 2011·Granted Oct 8, 2013·5 cites·24 claims
- 0279US9653367B2Methods including a processing of wafers and spin coating toolGLOBALFOUNDRIES INC·Filed 2015·Granted May 16, 2017·4 cites·8 claims
- 0374US9075934B2Reticle defect correction by second exposureHOTZEL ARTHUR·Filed 2013·Granted Jul 7, 2015·2 cites·16 claims
- 0473US8574795B2Lithographic CD correction by second exposureHOTZEL ARTHUR·Filed 2012·Granted Nov 5, 2013·2 cites·22 claims
- 0568US10161915B2In-situ contactless monitoring of photomask pellicle degradationGLOBALFOUNDRIES INC·Filed 2015·Granted Dec 25, 2018·1 cites·6 claims
- 0667US8785112B2Reticle defect correction by second exposureHOTZEL ARTHUR·Filed 2011·Granted Jul 22, 2014·1 cites·13 claims
- 0766US8518189B2Vapor clean for haze and particle removal from lithographic photomasksHOTZEL ARTHUR·Filed 2010·Granted Aug 27, 2013·1 cites·11 claims
- 0865US9341961B2Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniquesNING GUO XIANG·Filed 2013·Granted May 17, 2016·1 cites·7 claims
- 0965US8681310B2Mechanical fixture of pellicle to lithographic photomaskHOTZEL ARTHUR·Filed 2010·Granted Mar 25, 2014·1 cites·18 claims
- 1062US9091943B2Asymmetric reticle heating of multilayer reticles eliminated by dummy exposures and related methodsHOTZEL ARTHUR·Filed 2012·Granted Jul 28, 2015·1 cites·21 claims
- 1159US9005882B2Reticle defect correction by second exposureGLOBALFOUNDRIES INC·Filed 2014·Granted Apr 14, 2015·0 cites·20 claims
- 1251US9798238B2Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniquesGLOBALFOUNDRIES SG PTE LTD·Filed 2016·Granted Oct 24, 2017·0 cites·5 claims
- 1336US9798244B2Methods, apparatus, and systems for minimizing defectivity in top-coat-free lithography and improving reticle CD uniformityGLOBALFOUNDRIES INC·Filed 2015·Granted Oct 24, 2017·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →