Inventor · disambiguated record
Arun Murali
Also filed as: MURALI ARUN
2 granted patents·11 pending applications·8 citations·filing 2008–2024
51Inventor score
Top patents by PatentIndex Score
13 records- 0178US12367244B2System and methods for implementing a feature set of high-dimensional spatial data in sports predictionsSTATS LLC·Filed 2024·Granted Jul 22, 2025·1 cites·10 claims
- 0270US2025137723A1Chamber bodies having machined walls, chamber arrangements and semiconductor processing systems having chamber bodies with machined walls, and methods of making chamber bodiesASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0357US8437979B2Smart tether system for underwater navigation and cable shape measurementFRANK JEREMY E·Filed 2008·Granted May 7, 2013·7 cites·18 claims
- 0457US2025079167A1Methods of forming semiconductor structures, semiconductor processing systems and related computer program productsASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0554US2025112064A1Chamber arrangements, semiconductor processing systems including chamber arrangements and related material layer deposition methodsASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0654US2024355688A1Systems and methods for depositing material layers onto substratesASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0754US2025034714A1Reflectors, semiconductor processing systems having reflectors, and methods of depositing material layers in semiconductor processing systems using reflectorsASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0853US2024232711A1Techniques for training and analyzing a machine learning modelSTATS LLC·Filed 2024·Application pending·0 cites
- 0951US2024068103A1Chamber arrangements, semiconductor processing systems having chamber arrangements, and related material layer deposition methodsASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1051US2024175138A1Systems and methods for controlling pressure in substrate processing systemsASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1151US2025112042A1Method, system and apparatus for forming anisotropic layerASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 1246US2023265582A1Systems and methods for processing the surface of an epitaxially grown silicon film using a radical speciesASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 1344US2023125884A1Material layer deposition methods, semiconductor processing systems, and related computer program productsASM IP HOLDING BV·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →