Inventor · disambiguated record
Ashish Shrotriya
Also filed as: SHROTRIYA ASHISH · SHROTRIYA ASHISH V
5 granted patents·411 citations·filing 1996–1999
85Inventor score
Files withAPPLIED MATERIALS INC5
Top patents by PatentIndex Score
5 records- 0193US5843239ATwo-step process for cleaning a substrate processing chamberAPPLIED MATERIALS INC·Filed 1997·Granted Dec 1, 1998·142 cites·22 claims
- 0289US6068729ATwo step process for cleaning a substrate processing chamberAPPLIED MATERIALS INC·Filed 1998·Granted May 30, 2000·126 cites·15 claims
- 0384US5895530AMethod and apparatus for directing fluid through a semiconductor processing chamberAPPLIED MATERIALS INC·Filed 1996·Granted Apr 20, 1999·113 cites·28 claims
- 0457US6436303B1Film removal employing a remote plasma sourceAPPLIED MATERIALS INC·Filed 1999·Granted Aug 20, 2002·26 cites·20 claims
- 0530US6170430B1Gas feedthrough with electrostatic discharge characteristicAPPLIED MATERIALS INC·Filed 1999·Granted Jan 9, 2001·4 cites·10 claims
Join the waitlist — get patent alerts
Get an alert when Ashish Shrotriya files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →