Inventor · disambiguated record
Atsunobu Isobayashi
Also filed as: ISOBAYASHI ATSUNOBU
28 granted patents·12 pending applications·78 citations·filing 2009–2021
94Inventor score
Top patents by PatentIndex Score
40 records- 0193US8138097B1Method for processing semiconductor structure and device based on the sameISOBAYASHI ATSUNOBU·Filed 2010·Granted Mar 20, 2012·18 cites·19 claims
- 0292US9437716B2Semiconductor device comprising a graphene wireTOSHIBA KK·Filed 2015·Granted Sep 6, 2016·8 cites·13 claims
- 0389US8779590B2Semiconductor device and method of producing the sameISOBAYASHI ATSUNOBU·Filed 2012·Granted Jul 15, 2014·11 cites·10 claims
- 0488US9741663B2Semiconductor device and manufacturing method thereofTOSHIBA KK·Filed 2016·Granted Aug 22, 2017·7 cites·17 claims
- 0586US11493491B2Chemical sensor and method for detecting target substanceTOSHIBA KK·Filed 2019·Granted Nov 8, 2022·2 cites·16 claims
- 0682US9076795B1Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2014·Granted Jul 7, 2015·5 cites·20 claims
- 0779US8907495B2Semiconductor device and manufacturing method thereofTOSHIBA KK·Filed 2013·Granted Dec 9, 2014·3 cites·7 claims
- 0877US10031414B2Template, method of manufacturing the same, and imprint methodTOSHIBA MEMORY CORP·Filed 2014·Granted Jul 24, 2018·2 cites·10 claims
- 0976US10199391B2Semiconductor device and method of manufacturing the sameTOSHIBA MEMORY CORP·Filed 2017·Granted Feb 5, 2019·2 cites·7 claims
- 1076US8816472B2Semiconductor device and method for manufacturing the sameTOSHIBA KK·Filed 2013·Granted Aug 26, 2014·4 cites·21 claims
- 1173US9484206B2Semiconductor device including catalyst layer and graphene layer thereon and method for manufacturing the sameTOSHIBA KK·Filed 2015·Granted Nov 1, 2016·2 cites·19 claims
- 1271US8134234B2Application of Mn for damage restoration after etchbackISOBAYASHI ATSUNOBU·Filed 2009·Granted Mar 13, 2012·5 cites·29 claims
- 1369US8168528B2Restoration method using metal for better CD controllability and Cu filingISOBAYASHI ATSUNOBU·Filed 2009·Granted May 1, 2012·4 cites·27 claims
- 1464US12411133B2Chemical sensor device and method for manufacturing the sameTOSHIBA KK·Filed 2021·Granted Sep 9, 2025·0 cites·7 claims
- 1564US9646933B2Semiconductor device and manufacturing method thereofTOSHIBA KK·Filed 2016·Granted May 9, 2017·1 cites·17 claims
- 1664US9117738B2Interconnection of semiconductor device with graphene wireTOSHIBA KK·Filed 2013·Granted Aug 25, 2015·1 cites·4 claims
- 1763US9236268B2Manufacturing method of semiconductor device and lithography templateTOSHIBA KK·Filed 2014·Granted Jan 12, 2016·1 cites·11 claims
- 1862US9576905B2Semiconductor device and manufacturing method thereofTOSHIBA KK·Filed 2016·Granted Feb 21, 2017·1 cites·20 claims
- 1962US9030012B2Semiconductor device and manufacturing method thereofTOSHIBA KK·Filed 2014·Granted May 12, 2015·1 cites·13 claims
- 2059US11346783B2Chemical sensor kit and analysis methodTOSHIBA KK·Filed 2019·Granted May 31, 2022·0 cites·19 claims
- 2154US11635428B2Molecule detecting device and molecule detecting methodTOSHIBA KK·Filed 2020·Granted Apr 25, 2023·0 cites·7 claims
- 2254US2015056807A1Semiconductor device and manufacturing method thereofTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2353US9117851B2Semiconductor device comprising a graphene wireTOSHIBA KK·Filed 2013·Granted Aug 25, 2015·0 cites·16 claims
- 2452US2021278365A1Molecule detecting device and molecule detecting methodTOSHIBA KK·Filed 2020·Application pending·0 cites
- 2550US9209125B2Semiconductor device and manufacturing method of the sameTOSHIBA KK·Filed 2014·Granted Dec 8, 2015·0 cites·19 claims
- 2649US2020086323A1Apparatus for maintaining liquid membrane and chemical sensorTOSHIBA KK·Filed 2019·Application pending·0 cites
- 2748US8981561B1Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2014·Granted Mar 17, 2015·0 cites·8 claims
- 2847US9076794B2Semiconductor device using carbon nanotube, and manufacturing method thereofTOSHIBA KK·Filed 2013·Granted Jul 7, 2015·0 cites·15 claims
- 2947US8981569B2Semiconductor device with low resistance wiring and manufacturing method for the deviceTOSHIBA KK·Filed 2013·Granted Mar 17, 2015·0 cites·21 claims
- 3045US2018275084A1SensorTOSHIBA KK·Filed 2018·Application pending·0 cites
- 3144US2015228538A1Semiconductor device and manufacturing method thereofTOSHIBA KK·Filed 2014·Application pending·0 cites
- 3244US2019062818A1Sensor, reagent, method for manufacturing probe molecule, and method for manufacturing polymer moleculeTOSHIBA KK·Filed 2018·Application pending·0 cites
- 3343US9404880B1Sensor and method of manufacturing sensorTOSHIBA KK·Filed 2015·Granted Aug 2, 2016·0 cites·20 claims
- 3443US2014284814A1Semiconductor device and manufacturing method thereofTOSHIBA KK·Filed 2013·Application pending·0 cites
- 3543US2020300804A1SensorTOSHIBA KK·Filed 2019·Application pending·0 cites
- 3640US9865547B2Semiconductor device and manufacturing method thereofTOSHIBA KK·Filed 2016·Granted Jan 9, 2018·0 cites·14 claims
- 3737US2011266676A1Method for forming interconnection line and semiconductor structureTOSHIBA AMERICA ELECTRONIC·Filed 2010·Application pending·0 cites
- 3836US2017263562A1Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2016·Application pending·0 cites
- 3934US2016079176A1Semiconductor deviceTOSHIBA KK·Filed 2015·Application pending·0 cites
- 4034US2016276219A1Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →