Inventor · disambiguated record
Atsushi Sawachi
Also filed as: SAWACHI ATSUSHI
24 granted patents·11 pending applications·21 citations·filing 2011–2025
92Inventor score
Top patents by PatentIndex Score
35 records- 0195US12040166B2Substrate processing apparatus, substrate processing system, and maintenance methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 16, 2024·3 cites·16 claims
- 0292US12347660B2Substrate processing apparatus, substrate processing system, and maintenance methodTOKYO ELECTRON LTD·Filed 2024·Granted Jul 1, 2025·1 cites·20 claims
- 0383US10472717B2Gas supply system, plasma processing apparatus, and operation method for plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Nov 12, 2019·6 cites·21 claims
- 0482US12377503B2Part replacement system and part replacement deviceTOKYO ELECTRON LTD·Filed 2024·Granted Aug 5, 2025·0 cites·18 claims
- 0582US11538665B2Gas supply system, substrate processing apparatus, and control method for gas supply systemTOKYO ELECTRON LTD·Filed 2020·Granted Dec 27, 2022·1 cites·6 claims
- 0682US2025332675A1Part replacement system and part replacement deviceTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0780US2025293010A1Substrate processing apparatus, substrate processing system, and maintenance methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0879US11217432B2Gas supply system, plasma processing apparatus, and control method for gas supply systemTOKYO ELECTRON LTD·Filed 2019·Granted Jan 4, 2022·2 cites·11 claims
- 0979US10229844B2Gas supply system, gas supply control method and gas replacement methodTOKYO ELECTRON LTD·Filed 2016·Granted Mar 12, 2019·3 cites·5 claims
- 1077US10533916B2Method for inspecting for leaks in gas supply system valvesTOKYO ELECTRON LTD·Filed 2016·Granted Jan 14, 2020·1 cites·5 claims
- 1177US2024290591A1Measuring device, measuring method, and vacuum processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1269US11992912B2Part replacement system and part replacement deviceTOKYO ELECTRON LTD·Filed 2021·Granted May 28, 2024·0 cites·20 claims
- 1366US10665430B2Gas supply system, substrate processing system and gas supply methodTOKYO ELECTRON LTD·Filed 2017·Granted May 26, 2020·1 cites·15 claims
- 1464US12002666B2Measuring device, measuring method, and vacuum processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jun 4, 2024·0 cites·10 claims
- 1563US11694878B2Gas supply system, plasma processing apparatus, and control method for gas supply systemTOKYO ELECTRON LTD·Filed 2021·Granted Jul 4, 2023·0 cites·13 claims
- 1661US9477232B2Apparatus for dividing and supplying gas and method for dividing and supplying gasFUJIKIN KK·Filed 2014·Granted Oct 25, 2016·2 cites·10 claims
- 1760US11698648B2Gas supply system and gas supply methodTOKYO ELECTRON LTD·Filed 2021·Granted Jul 11, 2023·0 cites·8 claims
- 1859US10607819B2Cleaning method and processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Mar 31, 2020·1 cites·6 claims
- 1956US12170187B2Gas supply system, plasma processing apparatus, and gas supply methodTOKYO ELECTRON LTD·Filed 2023·Granted Dec 17, 2024·0 cites·17 claims
- 2056US10665431B2Processing methodTOKYO ELECTRON LTD·Filed 2018·Granted May 26, 2020·0 cites·19 claims
- 2156US2025251745A1Exhaust structure and exhaust method for flow rate control device, and gas supply system and gas supply method comprising sameFUJIKIN KK·Filed 2023·Application pending·0 cites
- 2255US12494383B2Gas supply device and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Dec 9, 2025·0 cites·5 claims
- 2353US10996688B2Gas supply system and gas supply methodTOKYO ELECTRON LTD·Filed 2018·Granted May 4, 2021·0 cites·13 claims
- 2452US2024212987A1Gas supply system, gas control system, plasma processing apparatus, and gas control methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2550US2018122620A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 2649US12424423B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Sep 23, 2025·0 cites·18 claims
- 2749US11513541B2Method of inspecting and inspection apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Nov 29, 2022·0 cites·5 claims
- 2848US12046454B2Performance calculation method and processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 23, 2024·0 cites·14 claims
- 2948US12033834B2Flow rate controller, gas supply system, and flow rate control methodTOKYO ELECTRON LTD·Filed 2019·Granted Jul 9, 2024·0 cites·4 claims
- 3044US2012132367A1Processing apparatusTEZUKA KAZUYUKI·Filed 2011·Application pending·0 cites
- 3144US2015206713A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 3243US2020124456A1Method of inspecting and flow rate controllerTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 3342US2015228457A1Gas supply method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3441US9904299B2Gas supply control methodTOKYO ELECTRON LTD·Filed 2016·Granted Feb 27, 2018·0 cites·6 claims
- 3536US2011226178A1Film deposition systemTOKYO ELECTRON LTD·Filed 2011·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Atsushi Sawachi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →