Inventor · disambiguated record
Atsushi Sawano
Also filed as: SAWANO ATSUSHI
13 granted patents·4 pending applications·89 citations·filing 1995–2010
90Inventor score
Top patents by PatentIndex Score
17 records- 0184US6517993B2Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Feb 11, 2003·25 cites·16 claims
- 0280US8367312B2Detergent for lithography and method of forming resist pattern with the sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Feb 5, 2013·5 cites·8 claims
- 0363US6551755B2Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Apr 22, 2003·7 cites·5 claims
- 0460US8158328B2Composition for formation of anti-reflection film, and method for formation of resist pattern using the sameSAWANO ATSUSHI·Filed 2008·Granted Apr 17, 2012·2 cites·13 claims
- 0559US6312863B1Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Nov 6, 2001·5 cites·12 claims
- 0654US5853948APositive photoresist compositions and multilayer resist materials using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Dec 29, 1998·15 cites·10 claims
- 0753US5728504APositive photoresist compositions and multilayer resist materials using the sameTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Mar 17, 1998·15 cites·12 claims
- 0850US5576138APositive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additivesTOKYO OHKA KOGYO CO LTD·Filed 1995·Granted Nov 19, 1996·13 cites·11 claims
- 0946US8216775B2Anti-reflection film forming material, and method for forming resist pattern using the sameSHIRAI YURIKO·Filed 2009·Granted Jul 10, 2012·0 cites·7 claims
- 1046US2010090372A1Coating formation agent for pattern micro-fabrication, and micropattern formation method using the sameTOKYO OHKA KOGYO CO LTD·Filed 2007·Application pending·0 cites
- 1142US8455182B2Composition for antireflection film formation and method for resist pattern formation using the compositionSAWANO ATSUSHI·Filed 2008·Granted Jun 4, 2013·0 cites·7 claims
- 1238US2002031720A1Novel copolymer, photoresist composition , and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2001·Application pending·0 cites
- 1335US2011065053A1Material for forming protective film and method for forming photoresist patternTOKYO OHKA KOGYO CO LTD·Filed 2010·Application pending·0 cites
- 1433US6083657APositive photoresist compositions and a process for producing the sameTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 4, 2000·2 cites·19 claims
- 1532US6884566B2Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Apr 26, 2005·0 cites·9 claims
- 1630US2003186171A1Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratioTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 1729US8323745B2Application liquid and method for formation of a silica-based coating film using the application liquidYAMADAYA TOKONORI·Filed 2010·Granted Dec 4, 2012·0 cites·5 claims
Join the waitlist — get patent alerts
Get an alert when Atsushi Sawano files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →