Inventor · disambiguated record
Ayumi Minamide
Also filed as: MINAMIDE AYUMI
11 granted patents·1 pending application·532 citations·filing 1996–2022
90Inventor score
Top patents by PatentIndex Score
12 records- 0195US6323560B1Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereofMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Nov 27, 2001·63 cites·3 claims
- 0295US5858620ASemiconductor device and method for manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Jan 12, 1999·267 cites·31 claims
- 0393US6579657B1Material for forming a fine pattern and method for manufacturing a semiconductor device using the sameMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jun 17, 2003·169 cites·6 claims
- 0459US5892291ARegistration accuracy measurement markMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Apr 6, 1999·15 cites·12 claims
- 0557US8119308B2Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomaskMINAMIDE AYUMI·Filed 2009·Granted Feb 21, 2012·1 cites·20 claims
- 0655US12352674B2Test method and method for manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2022·Granted Jul 8, 2025·0 cites·10 claims
- 0752US8835083B2Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor deviceRENESAS ELECTRONICS CORP·Filed 2013·Granted Sep 16, 2014·0 cites·4 claims
- 0847US8563200B2Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor deviceMINAMIDE AYUMI·Filed 2012·Granted Oct 22, 2013·0 cites·5 claims
- 0947US6171761B1Resist pattern forming method utilizing multiple baking and partial development stepsMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Jan 9, 2001·13 cites·26 claims
- 1039US6068952ARegistration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photomask and method of exposure thereofMITSUBISHI ELECTRIC CORP·Filed 1999·Granted May 30, 2000·4 cites·4 claims
- 1138US8426087B2Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout methodMINAMIDE AYUMI·Filed 2011·Granted Apr 23, 2013·0 cites·10 claims
- 1237US2003203618A1Manufacturing method for semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →