Inventor · disambiguated record
Barney M. Cohen
Also filed as: COHEN BARNEY · COHEN BARNEY M
12 granted patents·672 citations·filing 1995–2002
94Inventor score
Files withAPPLIED MATERIALS INC12
Top patents by PatentIndex Score
12 records- 0196US6110836AReactive plasma etch cleaning of high aspect ratio openingsAPPLIED MATERIALS INC·Filed 1999·Granted Aug 29, 2000·257 cites·17 claims
- 0287US5685941AInductively coupled plasma reactor with top electrode for enhancing plasma ignitionAPPLIED MATERIALS INC·Filed 1995·Granted Nov 11, 1997·62 cites·45 claims
- 0386US6589890B2Precleaning process for metal plug that minimizes damage to low-κ dielectricAPPLIED MATERIALS INC·Filed 2002·Granted Jul 8, 2003·32 cites·16 claims
- 0486US5763010AThermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layersAPPLIED MATERIALS INC·Filed 1996·Granted Jun 9, 1998·61 cites·18 claims
- 0584US6346489B1Precleaning process for metal plug that minimizes damage to low-κ dielectricAPPLIED MATERIALS INC·Filed 1999·Granted Feb 12, 2002·61 cites·33 claims
- 0677US6313042B1Cleaning contact with successive fluorine and hydrogen plasmasAPPLIED MATERIALS INC·Filed 1999·Granted Nov 6, 2001·56 cites·20 claims
- 0774US5688358AR.F. plasma reactor with larger-than-wafer pedestal conductorAPPLIED MATERIALS INC·Filed 1995·Granted Nov 18, 1997·34 cites·15 claims
- 0868US6077353APedestal insulator for a pre-clean chamberAPPLIED MATERIALS INC·Filed 1998·Granted Jun 20, 2000·35 cites·18 claims
- 0963US7014887B1Sequential sputter and reactive precleans of vias and contactsAPPLIED MATERIALS INC·Filed 1999·Granted Mar 21, 2006·26 cites·17 claims
- 1054US7053002B2Plasma preclean with argon, helium, and hydrogen gasesAPPLIED MATERIALS INC·Filed 1998·Granted May 30, 2006·19 cites·20 claims
- 1143US6547934B2Reduction of metal oxide in a dual frequency etch chamberAPPLIED MATERIALS INC·Filed 1998·Granted Apr 15, 2003·9 cites·13 claims
- 1238US6079354AThermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layersAPPLIED MATERIALS INC·Filed 1998·Granted Jun 27, 2000·20 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →