Inventor · disambiguated record
Bastiaan Onne Fagginger Auer
Also filed as: FAGGINGER AUER BASTIAAN ONNE
11 granted patents·2 pending applications·28 citations·filing 2014–2023
85Inventor score
Files withASML NETHERLANDS BV13
Top patents by PatentIndex Score
13 records- 0196US10488768B2Beat patterns for alignment on small metrology targetsASML NETHERLANDS BV·Filed 2018·Granted Nov 26, 2019·10 cites·20 claims
- 0293US10739687B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Aug 11, 2020·4 cites·22 claims
- 0392US10162271B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Dec 25, 2018·7 cites·20 claims
- 0487US10983445B2Method and apparatus for measuring a parameter of interest using image plane detection techniquesASML NETHERLANDS BV·Filed 2019·Granted Apr 20, 2021·3 cites·20 claims
- 0584US10599047B2Metrology apparatus, lithographic system, and method of measuring a structureASML NETHERLANDS BV·Filed 2018·Granted Mar 24, 2020·2 cites·15 claims
- 0679US10317805B2Method for monitoring a characteristic of illumination from a metrology apparatusASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·2 cites·19 claims
- 0771US11526085B2Metrology method and apparatus, substrate, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Dec 13, 2022·0 cites·20 claims
- 0855US2025251670A1Illumination mode selector and associated optical metrology toolASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0951US10571363B2Method of determining an optimal focus height for a metrology apparatusASML NETHERLANDS BV·Filed 2019·Granted Feb 25, 2020·0 cites·20 claims
- 1046US10585354B2Method of optimizing a metrology processASML NETHERLANDS BV·Filed 2019·Granted Mar 10, 2020·0 cites·20 claims
- 1145US10394135B2Method and apparatus for measuring a parameter of a lithographic process, computer program products for implementing such methods and apparatusASML NETHERLANDS BV·Filed 2017·Granted Aug 27, 2019·0 cites·17 claims
- 1245US2023288815A1Mapping metrics between manufacturing systemsASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1343US11556060B2Method of calibrating a plurality of metrology apparatuses, method of determining a parameter of interest, and metrology apparatusASML NETHERLANDS BV·Filed 2019·Granted Jan 17, 2023·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →