Inventor · disambiguated record
Banqiu Wu
Also filed as: WU BANQIU
45 granted patents·22 pending applications·483 citations·filing 2000–2025
97Inventor score
Top patents by PatentIndex Score
67 records- 0199US8932802B2Atomic layer deposition lithographyAPPLIED MATERIALS INC·Filed 2013·Granted Jan 13, 2015·337 cites·16 claims
- 0294US8962224B2Methods for controlling defects for extreme ultraviolet lithography (EUVL) photomask substrateWU BANQIU·Filed 2013·Granted Feb 24, 2015·10 cites·20 claims
- 0393US11798799B2Ultraviolet and ozone clean systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 24, 2023·2 cites·20 claims
- 0493US7771895B2Method of etching extreme ultraviolet light (EUV) photomasksAPPLIED MATERIALS INC·Filed 2006·Granted Aug 10, 2010·25 cites·26 claims
- 0592US8598016B2In-situ deposited mask layer for device singulation by laser scribing and plasma etchYALAMANCHILI MADHAVA RAO·Filed 2011·Granted Dec 3, 2013·20 cites·29 claims
- 0689US11803118B2Methods and apparatus for photomask processingAPPLIED MATERIALS INC·Filed 2021·Granted Oct 31, 2023·2 cites·20 claims
- 0785US8709706B2Methods and apparatus for performing multiple photoresist layer development and etching processesWU BANQIU·Filed 2012·Granted Apr 29, 2014·4 cites·19 claims
- 0883US9439330B13D IC computer systemWU BANQIU·Filed 2015·Granted Sep 6, 2016·4 cites·14 claims
- 0983US9250514B2Apparatus and methods for fabricating a photomask substrate for EUV applicationsAPPLIED MATERIALS INC·Filed 2014·Granted Feb 2, 2016·3 cites·20 claims
- 1082US8002899B2Method and apparatus for mask pellicle adhesive residue cleaningAPPLIED MATERIALS INC·Filed 2008·Granted Aug 23, 2011·21 cites·24 claims
- 1181US12128456B2Megasonic clean with cavity property monitoringAPPLIED MATERIALS INC·Filed 2023·Granted Oct 29, 2024·0 cites·20 claims
- 1279US10236198B2Methods for the continuous processing of substratesAPPLIED MATERIALS INC·Filed 2017·Granted Mar 19, 2019·2 cites·17 claims
- 1379US9911582B2Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin controlAPPLIED MATERIALS INC·Filed 2015·Granted Mar 6, 2018·2 cites·8 claims
- 1478US9439331B1Cost-effective cooling method for computer systemWU BANQIU·Filed 2015·Granted Sep 6, 2016·3 cites·15 claims
- 1577US12159782B2Ultraviolet and ozone clean systemAPPLIED MATERIALS INC·Filed 2023·Granted Dec 3, 2024·0 cites·20 claims
- 1677US7771894B2Photomask having self-masking layer and methods of etching sameAPPLIED MATERIALS INC·Filed 2006·Granted Aug 10, 2010·4 cites·28 claims
- 1777US6881321B2Production, refining and recycling of lightweight and reactive metals in ionic liquidsUNIV ALABAMA·Filed 2001·Granted Apr 19, 2005·12 cites·29 claims
- 1876US9748125B2Continuous substrate processing systemWU BANQIU·Filed 2013·Granted Aug 29, 2017·3 cites·6 claims
- 1976US9280051B2Methods for reducing line width roughness and/or critical dimension nonuniformity in a patterned photoresist layerAPPLIED MATERIALS INC·Filed 2014·Granted Mar 8, 2016·3 cites·19 claims
- 2076US8084757B2Contamination prevention in extreme ultraviolet lithographyWU BANQIU·Filed 2008·Granted Dec 27, 2011·4 cites·17 claims
- 2175US12233441B2Ultraviolet and ozone cleaning apparatus and method of usingAPPLIED MATERIALS INC·Filed 2022·Granted Feb 25, 2025·0 cites·8 claims
- 2274US11654460B2Megasonic clean with cavity property monitoringAPPLIED MATERIALS INC·Filed 2021·Granted May 23, 2023·0 cites·9 claims
- 2373US10710358B2Photomask pellicle glue residue removalAPPLIED MATERIALS INC·Filed 2019·Granted Jul 14, 2020·1 cites·20 claims
- 2473US7347920B2Production, refining and recycling of lightweight and reactive metals in ionic liquidsUNIV ALABAMA·Filed 2004·Granted Mar 25, 2008·6 cites·10 claims
- 2573US2024027894A1Methods and apparatus for photomask processingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2672US2024226358A1Atomic oxygen and ozone cleaning device having a temperature control apparatusAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2772US2025161999A1Ultraviolet and ozone cleaning apparatus and method of usingAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2871US12474697B2Intelligent processing toolsAPPLIED MATERIALS INC·Filed 2021·Granted Nov 18, 2025·0 cites·20 claims
- 2971US11114350B2Method for removing photoresist from photomask substrateAPPLIED MATERIALS INC·Filed 2019·Granted Sep 7, 2021·1 cites·15 claims
- 3063US2024422941A1Novel 3D Artificial Intelligence Computer SystemWU BANQIU·Filed 2024·Application pending·0 cites
- 3162US11964068B2Atomic oxygen and ozone cleaning device having a temperature control apparatusAPPLIED MATERIALS INC·Filed 2021·Granted Apr 23, 2024·0 cites·13 claims
- 3262US10933624B2Photomask pellicle glue residue removalAPPLIED MATERIALS INC·Filed 2020·Granted Mar 2, 2021·0 cites·20 claims
- 3361US9480187B2Cooling method for a 3D IC computer systemWU BANQIU·Filed 2015·Granted Oct 25, 2016·1 cites·12 claims
- 3461US6749336B2Ionic liquid temperature sensorFiled 2003·Granted Jun 15, 2004·11 cites·31 claims
- 3560US11644748B2Multi-volume baking chamber for mask cleanAPPLIED MATERIALS INC·Filed 2021·Granted May 9, 2023·0 cites·15 claims
- 3660US2025157800A1Oxidation-Reduction Adjustable PlasmaAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3759US12085849B2Baking chamber with shroud for mask cleanAPPLIED MATERIALS INC·Filed 2021·Granted Sep 10, 2024·0 cites·19 claims
- 3859US10962889B2Method and apparatus for high throughput photomask curingAPPLIED MATERIALS INC·Filed 2019·Granted Mar 30, 2021·0 cites·20 claims
- 3959US10928724B2Attachment feature removal from photomask in extreme ultraviolet lithography applicationAPPLIED MATERIALS INC·Filed 2019·Granted Feb 23, 2021·0 cites·19 claims
- 4058US10802392B2Photomask laser etchAPPLIED MATERIALS INC·Filed 2019·Granted Oct 13, 2020·0 cites·20 claims
- 4157US2025279334A1Novel 3D IC heat dissipation apparatus and methodWU BANQIU·Filed 2025·Application pending·0 cites
- 4257US2024201580A1Photomask handling assembly for atmospheric pressure plasma chamberAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4356US6343640B1Production of metal/refractory composites by bubbling gas through a meltUNIV ALABAMA·Filed 2000·Granted Feb 5, 2002·2 cites·19 claims
- 4456US2024118603A1Methods and apparatus for ruthenium oxide reduction on extreme ultraviolet photomasksAPPLIED MATERALS INC·Filed 2022·Application pending·0 cites
- 4556US2024339324A1Atmospheric Pressure Plasma for Substrate AnnealingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 4653US11921422B2Single-volume baking chamber for mask cleanAPPLIED MATERIALS INC·Filed 2021·Granted Mar 5, 2024·0 cites·19 claims
- 4753US9754765B2Electrodes for etchAPPLIED MATERIALS INC·Filed 2013·Granted Sep 5, 2017·0 cites·12 claims
- 4852US11054746B2Portion of layer removal at substrate edgeAPPLIED MATERIALS INC·Filed 2019·Granted Jul 6, 2021·0 cites·20 claims
- 4952US2013192761A1Rotary Substrate Processing SystemYUDOVSKY JOSEPH·Filed 2013·Application pending·0 cites
- 5050US11209804B2Intelligent processing toolsAPPLIED MATERIALS INC·Filed 2014·Granted Dec 28, 2021·0 cites·14 claims
Showing the top 50 of 67 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →