Inventor · disambiguated record
Been-Der Chen
Also filed as: CHEN BEEN-DER
17 granted patents·6 pending applications·98 citations·filing 2007–2023
93Inventor score
Top patents by PatentIndex Score
23 records- 0193US7707538B2Multivariable solver for optical proximity correctionBRION TECH INC·Filed 2007·Granted Apr 27, 2010·28 cites·60 claims
- 0292US8938699B2Multivariable solver for optical proximity correctionASML NETHERLANDS BV·Filed 2013·Granted Jan 20, 2015·6 cites·32 claims
- 0391US8560979B2Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured therebyWONG WILLIAM S·Filed 2012·Granted Oct 15, 2013·7 cites·15 claims
- 0489US11176307B2Method and system for pattern configurationASML NETHERLANDS BV·Filed 2017·Granted Nov 16, 2021·4 cites·20 claims
- 0588US11232249B2Method for determining curvilinear patterns for patterning deviceASML NETHERLANDS BV·Filed 2019·Granted Jan 25, 2022·5 cites·20 claims
- 0688US8812998B2Method and apparatus for cost function based simultaneous OPC and SBAR optimizationTAO JUN·Filed 2012·Granted Aug 19, 2014·7 cites·21 claims
- 0788US8448099B2Multivariable solver for optical proximity correctionASML NETHERLANDS BV·Filed 2012·Granted May 21, 2013·4 cites·30 claims
- 0885US8443312B2Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)TSAI MIN-CHUN·Filed 2011·Granted May 14, 2013·13 cites·22 claims
- 0985US8291352B2Multivariable solver for optical proximity correctionWONG WILLIAM S·Filed 2010·Granted Oct 16, 2012·4 cites·32 claims
- 1083US9619607B2Method and apparatus for cost function based simultaneous OPC and SBAR optimizationASML NETHERLANDS BV·Filed 2014·Granted Apr 11, 2017·7 cites·25 claims
- 1181US8239786B2Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured therebyWONG WILLIAM S·Filed 2009·Granted Aug 7, 2012·5 cites·20 claims
- 1278US8826198B2Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)ASML NETHERLANDS BV·Filed 2013·Granted Sep 2, 2014·4 cites·15 claims
- 1374US12430490B2Method for generating patterning device pattern at patch boundaryASML NETHERLANDS BV·Filed 2023·Granted Sep 30, 2025·0 cites·12 claims
- 1474US9418194B2Method and apparatus for model based flexible MRCASML NETHERLANDS BV·Filed 2014·Granted Aug 16, 2016·2 cites·16 claims
- 1572US11797748B2Method for generating patterning device pattern at patch boundaryASML NETHERLANDS BV·Filed 2019·Granted Oct 24, 2023·1 cites·20 claims
- 1671US11734490B2Method for determining curvilinear patterns for patterning deviceASML NETHERLANDS BV·Filed 2021·Granted Aug 22, 2023·0 cites·22 claims
- 1760US8806389B2Method and apparatus for model based flexible MRCASML NETHERLANDS BV·Filed 2012·Granted Aug 12, 2014·1 cites·14 claims
- 1859US2025189881A1Lithographic pattern representation with curvilinear elementsASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1953US2025147433A1Field of view selection for metrology associated with semiconductor manufacturingASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2047US2024370621A1Pattern selection systems and methodsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2144US2024119582A1A machine learning model using target pattern and reference layer pattern to determine optical proximity correction for maskASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2241US2020380362A1Methods for training machine learning model for computation lithographyASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
- 2340US2020050099A1Assist feature placement based on machine learningASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →