Inventor · disambiguated record
Benjamin Szu-Min Lin
Also filed as: LIN BENJAMIN · LIN BENJAMIN S · LIN BENJAMIN SZU-MIN
52 granted patents·23 pending applications·646 citations·filing 1997–2023
98Inventor score
Files withUNITED MICROELECTRONICS CORP42LIN BENJAMIN SZU-MIN8WINBOND ELECTRONICS CORP4INFINEON TECHNOLOGIES AG2INFOPOWER TAIWAN CORP2
Top patents by PatentIndex Score
75 records- 0186US6004702APhase-shifting mask structure and method of fabricating the sameUNITED MICROELECTRONICS CORP·Filed 1998·Granted Dec 21, 1999·59 cites·14 claims
- 0284US6010807APhase-shifting mask for photolithography in semiconductor fabricationsUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jan 4, 2000·52 cites·7 claims
- 0383US6100014AMethod of forming an opening in a dielectric layer through a photoresist layer with silylated sidewall spacersUNITED MICROELECTRONICS CORP·Filed 1998·Granted Aug 8, 2000·51 cites·11 claims
- 0482US5989997AMethod for forming dual damascene structureUNITED MICROELECTRONICS CORP·Filed 1998·Granted Nov 23, 1999·67 cites·27 claims
- 0580US6534412B1Method for removing native oxideUNITED MICROELECTRONICS CORP·Filed 2000·Granted Mar 18, 2003·23 cites·6 claims
- 0680US6071656APhotolithography technique utilizing alignment marks at scribe line intersectionsUNITED MICROELECTRONICS CORP·Filed 1999·Granted Jun 6, 2000·43 cites·8 claims
- 0775US6740473B1Method for shrinking critical dimension of semiconductor devicesUNITED MICROELECTRONICS CORP·Filed 2002·Granted May 25, 2004·14 cites·14 claims
- 0875US6042996AMethod of fabricating a dual damascene structureUNITED MICROELECTRONICS CORP·Filed 1998·Granted Mar 28, 2000·46 cites·19 claims
- 0971US5998260AMethod for manufacturing DRAM capacitorUNITED MICROELECTRONICS CORP·Filed 1998·Granted Dec 7, 1999·29 cites·37 claims
- 1067US7052808B2Transmission mask with differential attenuation to improve ISO-dense proximityUNITED MICROELECTRONICS CO·Filed 2003·Granted May 30, 2006·8 cites·19 claims
- 1166US2009029029A1Apparatus and method for manufacturing a consumable candy drinking strawLIN BENJAMIN·Filed 2008·Application pending·0 cites
- 1264US7807342B2Transmission mask with differential attenuation to improve ISO-dense proximityINFINEON TECHNOLOGIES AG·Filed 2005·Granted Oct 5, 2010·1 cites·6 claims
- 1364US7018788B2Phase shifting lithographic processUNITED MICROELECTRONICS CORP·Filed 2004·Granted Mar 28, 2006·6 cites·10 claims
- 1464US6348287B1Multiphase phase shifting maskUNITED MICROELECTRONICS CORP·Filed 2000·Granted Feb 19, 2002·7 cites·14 claims
- 1562US12452521B2Providing a template for media content generationSNAP INC·Filed 2023·Granted Oct 21, 2025·0 cites·16 claims
- 1662US6844143B2Sandwich photoresist structure in photolithographic processUNITED MICROELECTRONICS CORP·Filed 2002·Granted Jan 18, 2005·8 cites·7 claims
- 1759US7074528B2Effective assist pattern for nested and isolated contactsINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jul 11, 2006·5 cites·30 claims
- 1857US6238825B1Mask with alternating scattering barsUNITED MICROELECTRONICS CROP·Filed 1999·Granted May 29, 2001·16 cites·5 claims
- 1956US6057064ADouble-alternating phase-shifting maskUNITED MICROELECTRONICS CORP·Filed 1998·Granted May 2, 2000·15 cites·8 claims
- 2056US6048650AHalf tone phase shift mask comprising second pattern layer on backside of substrateUNITED MICROELECTRONICS CORP·Filed 1998·Granted Apr 11, 2000·15 cites·19 claims
- 2156US6022645ADouble-sided photomaskUNITED MICROELECTRONICS CORP·Filed 1998·Granted Feb 8, 2000·15 cites·17 claims
- 2256US2003110086A1Electric-business method for customized merchandiseFiled 2001·Application pending·0 cites
- 2354US6849393B2Phase shifting lithographic processUNITED MICROELECTRONICS CORP·Filed 2003·Granted Feb 1, 2005·3 cites·15 claims
- 2451US6124162AMethod for manufacturing cylindrical lower electrode of DRAM capacitorUNITED MICROELECTRONICS CORP·Filed 1998·Granted Sep 26, 2000·12 cites·9 claims
- 2550US7268070B2Profile improvement method for patterningUNITED MICROELECTRONICS CORP·Filed 2003·Granted Sep 11, 2007·2 cites·13 claims
- 2649US5847818ACD vernier apparatus for SEM CD measurementWINBOND ELECTRONICS CORP·Filed 1997·Granted Dec 8, 1998·16 cites·9 claims
- 2746US8229062B2Transmission mask with differential attenuation to improve ISO-dense proximityLIU HANG YIP·Filed 2010·Granted Jul 24, 2012·0 cites·15 claims
- 2846US6277685B1Method of forming a node contact hole on a semiconductor waferUNITED MICROELECTRONICS CORP·Filed 1999·Granted Aug 21, 2001·13 cites·11 claims
- 2946US6071653AMethod for fabricating a photomaskUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jun 6, 2000·9 cites·23 claims
- 3045US2006234855A1Preparation of solid oxide fuel cell electrodes by electrodepositionGORTE RAYMOND J·Filed 2005·Application pending·0 cites
- 3144US6207328B1Method of forming a phase shift maskUNITED MICROELECTRONICS CORP·Filed 1999·Granted Mar 27, 2001·8 cites·7 claims
- 3244US5888865AMethod for manufacturing dram capacitorUNITED MICROELECTRONICS CORP·Filed 1998·Granted Mar 30, 1999·7 cites·7 claims
- 3344US2008160459A1Method of forming a patternLIN BENJAMIN SZU-MIN·Filed 2006·Application pending·0 cites
- 3443US6511891B2Method of preventing toppling of lower electrode through flush cleaningUNITED MICROELECTRONICS CORP·Filed 2001·Granted Jan 28, 2003·2 cites·9 claims
- 3543US2007224545A1Method for immersion lithographyLIN BENJAMIN SZU-MIN·Filed 2006·Application pending·0 cites
- 3642US7476472B2Method for designing photomaskUNITED MICROELECTRONICS CORP·Filed 2005·Granted Jan 13, 2009·0 cites·8 claims
- 3742US6117757AMethod of forming landing pads for bit line and node contactUNITED MICROELECTRONICS CORP·Filed 1998·Granted Sep 12, 2000·10 cites·10 claims
- 3842US2007190805A1Method for improving the alignment accuracy of semiconductor process and method of forming openingLIN BENJAMIN SZU-MIN·Filed 2006·Application pending·0 cites
- 3941US6866967B2Structure of phase shifting maskUNITED MICROELECTRONICS CORP·Filed 2002·Granted Mar 15, 2005·0 cites·25 claims
- 4041US6296991B1Bi-focus exposure processUNITED MICROELECTRONICS CORP·Filed 1999·Granted Oct 2, 2001·6 cites·12 claims
- 4141US2007182948A1Semiconductor exposure method and method of controlling semiconductor exposure apparatusLIN BENJAMIN SZU-MIN·Filed 2006·Application pending·0 cites
- 4241US2001011275A1Distributive web page management systemFiled 2001·Application pending·0 cites
- 4341US2006257795A1Method for forming composite pattern including different types of patternsLIN BENJAMIN SZU-MIN·Filed 2005·Application pending·0 cites
- 4441US2006191863A1Method for fabricating etch mask and patterning process using the sameLIN BENJAMIN SZU-MIN·Filed 2005·Application pending·0 cites
- 4541US2005250019A1Mask device for photolithography and application thereofUNITED MICROELECTRONICS CORP·Filed 2004·Application pending·0 cites
- 4640US7633601B2Method and related operation system for immersion lithographyUNITED MICROELECTRONICS CORP·Filed 2006·Granted Dec 15, 2009·0 cites·8 claims
- 4740US6296974B1Method of forming a multi-layer photo maskFiled 1999·Granted Oct 2, 2001·6 cites·9 claims
- 4840US2007024835A1Method for improving illumination uniformity in exposure process, and exposure apparatusHUANG KUO-CHUN·Filed 2005·Application pending·0 cites
- 4940US2006133222A1Lithography methodLIN BENJAMIN SZU-MIN·Filed 2004·Application pending·0 cites
- 5040US2008055597A1Method for characterizing line width roughness (lwr) of printed featuresSUN JIE-WEI·Filed 2006·Application pending·0 cites
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