Inventor · disambiguated record
Benjamin Schmiege
Also filed as: SCHMIEGE BENJAMIN
26 granted patents·3 pending applications·1,104 citations·filing 2014–2020
95Inventor score
Top patents by PatentIndex Score
29 records- 0198US10083834B2Methods of forming self-aligned viasAPPLIED MATERIALS INC·Filed 2017·Granted Sep 25, 2018·64 cites·15 claims
- 0298US9449843B1Selectively etching metals and metal nitrides conformallyAPPLIED MATERIALS INC·Filed 2015·Granted Sep 20, 2016·399 cites·15 claims
- 0398US9309598B2Oxide and metal removalAPPLIED MATERIALS INC·Filed 2014·Granted Apr 12, 2016·560 cites·18 claims
- 0497US10465294B2Oxide and metal removalAPPLIED MATERIALS INC·Filed 2016·Granted Nov 5, 2019·25 cites·17 claims
- 0595US9528183B2Cobalt removal for chamber clean or pre-clean processAPPLIED MATERIALS INC·Filed 2014·Granted Dec 27, 2016·25 cites·11 claims
- 0693US9390940B2Methods of etching films comprising transition metalsAPPLIED MATERIALS INC·Filed 2014·Granted Jul 12, 2016·13 cites·17 claims
- 0791US10906925B2Ruthenium precursors for ALD and CVD thin film deposition and uses thereofAPPLIED MATERIALS INC·Filed 2020·Granted Feb 2, 2021·2 cites·8 claims
- 0890US10577386B2Ruthenium precursors for ALD and CVD thin film deposition and uses thereofAPPLIED MATERIALS INC·Filed 2017·Granted Mar 3, 2020·2 cites·11 claims
- 0986US9540736B2Methods of etching films with reduced surface roughnessAPPLIED MATERIALS INC·Filed 2015·Granted Jan 10, 2017·2 cites·19 claims
- 1083US9896770B2Methods of etching films with reduced surface roughnessAPPLIED MATERIALS INC·Filed 2016·Granted Feb 20, 2018·2 cites·16 claims
- 1181US10000853B2System and method for controllable non-volatile metal removalVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jun 19, 2018·2 cites·11 claims
- 1277US10643840B2Selective deposition defects removal by chemical etchAPPLIED MATERIALS INC·Filed 2018·Granted May 5, 2020·2 cites·20 claims
- 1376US9514933B2Film deposition using spatial atomic layer deposition or pulsed chemical vapor depositionAPPLIED MATERIALS INC·Filed 2014·Granted Dec 6, 2016·3 cites·18 claims
- 1474US9881787B2Deposition methods for uniform and conformal hybrid titanium oxide filmsAPPLIED MATERIALS INC·Filed 2016·Granted Jan 30, 2018·2 cites·12 claims
- 1570US10760159B2Methods and apparatus for depositing yttrium-containing filmsAPPLIED MATERIALS INC·Filed 2017·Granted Sep 1, 2020·0 cites·20 claims
- 1668US2020392624A1Methods and apparatus for depositing yttrium-containing filmsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1767US9611552B2System and method for controllable non-volatile metal removalVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Apr 4, 2017·1 cites·6 claims
- 1863US10233547B2Methods of etching films with reduced surface roughnessAPPLIED MATERIALS INC·Filed 2018·Granted Mar 19, 2019·0 cites·19 claims
- 1961US11094544B2Methods of forming self-aligned viasAPPLIED MATERIALS INC·Filed 2019·Granted Aug 17, 2021·0 cites·4 claims
- 2060US10633743B2System and method for controllable non-volatile metal removalVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Apr 28, 2020·0 cites·10 claims
- 2159US10410865B2Methods of forming self-aligned viasAPPLIED MATERIALS INC·Filed 2018·Granted Sep 10, 2019·0 cites·17 claims
- 2259US10297462B2Methods of etching films comprising transition metalsAPPLIED MATERIALS INC·Filed 2017·Granted May 21, 2019·0 cites·18 claims
- 2356US9799533B2Methods of etching films comprising transition metalsAPPLIED MATERIALS INC·Filed 2016·Granted Oct 24, 2017·0 cites·19 claims
- 2453US10323054B2Precursors for deposition of metal, metal nitride and metal oxide based films of transition metalsAPPLIED MATERIALS INC·Filed 2017·Granted Jun 18, 2019·0 cites·18 claims
- 2553US2019062916A1Lanthanide, Yttrium and Scandium precursors for ALD, CVD and Thin Film Doping and Methods of UseAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 2649US10643838B2In-situ formation of non-volatile lanthanide thin film precursors and use in ALD and CVDAPPLIED MATERIALS INC·Filed 2018·Granted May 5, 2020·0 cites·20 claims
- 2749US9005704B2Methods for depositing films comprising cobalt and cobalt nitridesAPPLIED MATERIALS INC·Filed 2014·Granted Apr 14, 2015·0 cites·20 claims
- 2849US2017356083A1Lanthanide, Yttrium And Scandium Precursors For ALD, CVD And Thin Film Doping And Methods Of UseAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 2946US10242885B2Selective dry etching of metal films comprising multiple metal oxidesAPPLIED MATERIALS INC·Filed 2017·Granted Mar 26, 2019·0 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when Benjamin Schmiege files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →