Inventor · disambiguated record
Bhaskar Kumar
Also filed as: KUMAR BHASKAR
27 granted patents·7 pending applications·38 citations·filing 2009–2024
93Inventor score
Top patents by PatentIndex Score
34 records- 0191US9646876B2Aluminum nitride barrier layerAPPLIED MATERIALS INC·Filed 2015·Granted May 9, 2017·9 cites·10 claims
- 0290US11721545B2Method of using dual frequency RF power in a process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Aug 8, 2023·2 cites·16 claims
- 0387US11488811B2Chucking process and system for substrate processing chambersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 1, 2022·2 cites·20 claims
- 0487US11069514B2Remote capacitively coupled plasma source with improved ion blockerAPPLIED MATERIALS INC·Filed 2019·Granted Jul 20, 2021·3 cites·19 claims
- 0587US10074559B1Selective poreseal deposition prevention and residue removal using SAMAPPLIED MATERIALS INC·Filed 2017·Granted Sep 11, 2018·5 cites·17 claims
- 0685US11959174B2Shunt door for magnets in plasma process chamberAPPLIED MATERIALS INC·Filed 2020·Granted Apr 16, 2024·1 cites·20 claims
- 0785US8846437B2High efficiency thin film transistor device with gallium arsenide layerSINGH KAUSHAL K·Filed 2011·Granted Sep 30, 2014·9 cites·15 claims
- 0883US10892143B2Technique to prevent aluminum fluoride build up on the heaterAPPLIED MATERIALS INC·Filed 2017·Granted Jan 12, 2021·1 cites·17 claims
- 0980US10748797B2Plasma parameters and skew characterization by high speed imagingAPPLIED MATERIALS INC·Filed 2018·Granted Aug 18, 2020·2 cites·10 claims
- 1077US12106958B2Method of using dual frequency RF power in a process chamberAPPLIED MATERIALS INC·Filed 2023·Granted Oct 1, 2024·0 cites·20 claims
- 1176US2024271284A1Shunt door for magnets in plasma process chamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1273US9252392B2Thin film encapsulation-thin ultra high barrier layer for OLED applicationAPPLIED MATERIALS INC·Filed 2014·Granted Feb 2, 2016·2 cites·20 claims
- 1372US12020911B2Chucking process and system for substrate processing chambersAPPLIED MATERIALS INC·Filed 2022·Granted Jun 25, 2024·0 cites·20 claims
- 1471US9780223B2Gallium arsenide based materials used in thin film transistor applicationsAPPLIED MATERIALS INC·Filed 2016·Granted Oct 3, 2017·1 cites·13 claims
- 1568US11495440B2Plasma density control on substrate edgeAPPLIED MATERIALS INC·Filed 2020·Granted Nov 8, 2022·0 cites·20 claims
- 1668US2021351020A1Remote Capacitively Coupled Plasma Source with Improved Ion BlockerAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1767US11545376B2Plasma parameters and skew characterization by high speed imagingAPPLIED MATERIALS INC·Filed 2020·Granted Jan 3, 2023·0 cites·20 claims
- 1863US12460298B2Showerhead design to control stray depositionAPPLIED MATERIALS INC·Filed 2021·Granted Nov 4, 2025·0 cites·18 claims
- 1963US11120976B2Apparatus and methods for removing contaminant particles in a plasma processAPPLIED MATERIALS INC·Filed 2020·Granted Sep 14, 2021·0 cites·20 claims
- 2063US9793108B2Interconnect integration for sidewall pore seal and via cleanlinessAPPLIED MATERIALS INC·Filed 2015·Granted Oct 17, 2017·1 cites·19 claims
- 2160US11996273B2Methods of seasoning process chambersAPPLIED MATERIALS INC·Filed 2020·Granted May 28, 2024·0 cites·9 claims
- 2259US10790121B2Plasma density control on substrate edgeAPPLIED MATERIALS INC·Filed 2018·Granted Sep 29, 2020·0 cites·20 claims
- 2358US10714319B2Apparatus and methods for removing contaminant particles in a plasma processAPPLIED MATERIALS INC·Filed 2019·Granted Jul 14, 2020·0 cites·10 claims
- 2457US11515191B2Graded dimple height pattern on heater for lower backside damage and low chucking voltageAPPLIED MATERIALS INC·Filed 2019·Granted Nov 29, 2022·0 cites·17 claims
- 2556US12142468B2Stress treatments for cover wafersAPPLIED MATERIALS INC·Filed 2021·Granted Nov 12, 2024·0 cites·19 claims
- 2656US11699585B2Methods of forming hardmasksAPPLIED MATERIALS INC·Filed 2020·Granted Jul 11, 2023·0 cites·20 claims
- 2755US11859275B2Techniques to improve adhesion and defects for tungsten carbide filmAPPLIED MATERIALS INC·Filed 2019·Granted Jan 2, 2024·0 cites·20 claims
- 2852US10688538B2Aluminum fluoride mitigation by plasma treatmentAPPLIED MATERIALS INC·Filed 2017·Granted Jun 23, 2020·0 cites·20 claims
- 2952US8895842B2High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cellsSHENG SHURAN·Filed 2009·Granted Nov 25, 2014·0 cites·15 claims
- 3048US2022178026A1Carbon cvd deposition methods to mitigate stress induced defectsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3148US2022178017A1Cfx layer to protect aluminum surface from over-oxidationAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3245US2016172238A1Selective sealant removalAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3340US2018294139A1Gas phase particle reduction in pecvd chamberAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 3436US2011263074A1Apparatus and methods for reducing light induced damage in thin film solar cellsAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →