Inventor · disambiguated record
Boris Bittner
Also filed as: BITTNER BORIS
40 granted patents·5 pending applications·129 citations·filing 2006–2021
97Inventor score
Top patents by PatentIndex Score
45 records- 0195US7830611B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Nov 9, 2010·34 cites·48 claims
- 0294US8203696B2Projection exposure apparatus with optimized adjustment possibilityBITTNER BORIS·Filed 2011·Granted Jun 19, 2012·20 cites·6 claims
- 0393US9939730B2Optical assemblyZEISS CARL SMT GMBH·Filed 2015·Granted Apr 10, 2018·7 cites·31 claims
- 0493US9760019B2Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Sep 12, 2017·6 cites·23 claims
- 0592US9170497B2Projection exposure apparatus with at least one manipulatorZEISS CARL SMT GMBH·Filed 2013·Granted Oct 27, 2015·7 cites·21 claims
- 0691US7990622B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2010·Granted Aug 2, 2011·7 cites·47 claims
- 0790US10401540B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2017·Granted Sep 3, 2019·3 cites·21 claims
- 0889US11112543B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2019·Granted Sep 7, 2021·2 cites·20 claims
- 0986US10151922B2Wavefront correction element for use in an optical systemZEISS CARL SMT GMBH·Filed 2017·Granted Dec 11, 2018·3 cites·18 claims
- 1086US10061206B2Projection lens with wave front manipulator and related method and apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Aug 28, 2018·3 cites·18 claims
- 1185US9910364B2Projection exposure apparatus including at least one mirrorZEISS CARL SMT GMBH·Filed 2016·Granted Mar 6, 2018·3 cites·15 claims
- 1284US9927714B2Projection exposure apparatus with at least one manipulatorZEISS CARL SMT GMBH·Filed 2017·Granted Mar 27, 2018·3 cites·20 claims
- 1379US10001631B2Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film elementZEISS CARL SMT GMBH·Filed 2014·Granted Jun 19, 2018·6 cites·40 claims
- 1479US9494868B2Lithographic projection objectiveZEISS CARL SMT GMBH·Filed 2013·Granted Nov 15, 2016·2 cites·34 claims
- 1579US9134613B2Illumination and displacement device for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Sep 15, 2015·3 cites·25 claims
- 1678US10303063B2Projection exposure apparatus with at least one manipulatorZEISS CARL SMT GMBH·Filed 2017·Granted May 28, 2019·1 cites·20 claims
- 1777US9377694B2Projection arrangementZEISS CARL SMT GMBH·Filed 2013·Granted Jun 28, 2016·2 cites·33 claims
- 1876US9164402B2Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Oct 20, 2015·2 cites·20 claims
- 1974US10018907B2Method of operating a microlithographic projection apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Jul 10, 2018·2 cites·18 claims
- 2074US8605253B2Lithographic projection objectiveROGALSKY OLAF·Filed 2008·Granted Dec 10, 2013·4 cites·46 claims
- 2173US9817316B2Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Nov 14, 2017·1 cites·34 claims
- 2272US12025818B2Optical element having a coating for influencing heating radiation and optical arrangementZEISS CARL SMT GMBH·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
- 2371US10474036B2Optical element and optical arrangement therewithZEISS CARL SMT GMBH·Filed 2016·Granted Nov 12, 2019·1 cites·24 claims
- 2471US9354524B2Projection exposure apparatus with optimized adjustment possibilityBITTNER BORIS·Filed 2012·Granted May 31, 2016·1 cites·66 claims
- 2568US10261425B2Projection exposure apparatus with a highly flexible manipulatorZEISS CARL SMT GMBH·Filed 2015·Granted Apr 16, 2019·1 cites·21 claims
- 2667US9846367B2Projection exposure apparatus with at least one manipulatorZEISS CARL SMT GMBH·Filed 2015·Granted Dec 19, 2017·1 cites·24 claims
- 2766US9348234B2Microlithographic apparatusZEISS CARL SMT GMBH·Filed 2015·Granted May 24, 2016·1 cites·22 claims
- 2861US2019025709A1Lithographic projection objectiveZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 2960US9052609B2Projection exposure apparatus with optimized adjustment possibilityZEISS CARL SMT GMBH·Filed 2014·Granted Jun 9, 2015·0 cites·30 claims
- 3059US9372411B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jun 21, 2016·1 cites·34 claims
- 3159US8174676B2Method for correcting a lithography projection objective, and such a projection objectiveULRICH WILHELM·Filed 2011·Granted May 8, 2012·1 cites·21 claims
- 3258US10054860B2Projection exposure apparatus with optimized adjustment possibilityZEISS CARL SMT GMBH·Filed 2016·Granted Aug 21, 2018·0 cites·28 claims
- 3358US10042265B2Lithographic projection objectiveZEISS CARL SMT GMBH·Filed 2016·Granted Aug 7, 2018·0 cites·11 claims
- 3458US9470872B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2014·Granted Oct 18, 2016·1 cites·21 claims
- 3555US2018136565A1Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 3654US9709770B2Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jul 18, 2017·0 cites·14 claims
- 3752US9423696B2Projection exposure apparatus with optimized adjustment possibilityZEISS CARL SMT GMBH·Filed 2013·Granted Aug 23, 2016·0 cites·16 claims
- 3850US9829800B2System correction from long timescalesZEISS CARL SMT GMBH·Filed 2014·Granted Nov 28, 2017·0 cites·20 claims
- 3948US8659744B2Method for correcting a lithography projection objective, and such a projection objectiveULRICH WILHELM·Filed 2012·Granted Feb 25, 2014·0 cites·32 claims
- 4045US10754132B2Imaging optical system for microlithographyZEISS CARL SMT GMBH·Filed 2013·Granted Aug 25, 2020·0 cites·31 claims
- 4144US9235143B2Microlithographic projection exposure apparatusBITTNER BORIS·Filed 2012·Granted Jan 12, 2016·0 cites·20 claims
- 4244US2014307308A1Reflective Optical Element for the EUV Wavelength Range, Method for Producing and for Correcting Such an Element, Projection Lens for Microlithography Comprising Such an Element, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection LensZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 4342US9606446B2Reflective optical element for EUV lithography and method of manufacturing a reflective optical elementZEISS CARL SMT GMBH·Filed 2015·Granted Mar 28, 2017·0 cites·18 claims
- 4441US2007019305A1Method for correcting a lithography projection objective, and such a projection objectiveULRICH WILHELM·Filed 2006·Application pending·0 cites
- 4533US2016161852A1Mirror for a microlithographic projection exposure system and method for processing a mirrorZEISS CARL SMT GMBH·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →