Inventor · disambiguated record
Boris Volosskiy
Also filed as: VOLOSSKIY BORIS
14 granted patents·10 pending applications·95 citations·filing 2017–2025
92Inventor score
Files withLAM RES CORP24
Top patents by PatentIndex Score
24 records- 0198US12094711B2Tin oxide films in semiconductor device manufacturingLAM RES CORP·Filed 2022·Granted Sep 17, 2024·5 cites·18 claims
- 0297US12105422B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2020·Granted Oct 1, 2024·13 cites·12 claims
- 0397US10546748B2Tin oxide films in semiconductor device manufacturingLAM RES CORP·Filed 2018·Granted Jan 28, 2020·25 cites·20 claims
- 0496US12183589B2Tin oxide mandrels in patterningLAM RES CORP·Filed 2021·Granted Dec 31, 2024·3 cites·20 claims
- 0596US11322351B2Tin oxide films in semiconductor device manufacturingLAM RES CORP·Filed 2019·Granted May 3, 2022·15 cites·32 claims
- 0695US12510825B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2024·Granted Dec 30, 2025·2 cites·33 claims
- 0795US12510826B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2024·Granted Dec 30, 2025·2 cites·12 claims
- 0895US11355353B2Tin oxide mandrels in patterningLAM RES CORP·Filed 2019·Granted Jun 7, 2022·15 cites·15 claims
- 0993US12062538B2Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvementLAM RES CORP·Filed 2020·Granted Aug 13, 2024·3 cites·32 claims
- 1091US12211691B2Dry development of resistsLAM RES CORP·Filed 2019·Granted Jan 28, 2025·8 cites·12 claims
- 1190US12437995B2Tin oxide films in semiconductor device manufacturingLAM RES CORP·Filed 2022·Granted Oct 7, 2025·1 cites·5 claims
- 1288US12436464B2Pre-exposure photoresist curing to enhance EUV lithographic performanceLAM RES CORP·Filed 2021·Granted Oct 7, 2025·2 cites·25 claims
- 1387US12417916B2Tin oxide films in semiconductor device manufacturingLAM RES CORP·Filed 2021·Granted Sep 16, 2025·1 cites·16 claims
- 1480US2025087498A1Tin oxide mandrels in patterningLAM RES CORP·Filed 2024·Application pending·0 cites
- 1573US2024429045A1Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvementLAM RES CORP·Filed 2024·Application pending·0 cites
- 1672US2025112045A1Dry development of resistsLAM RES CORP·Filed 2024·Application pending·0 cites
- 1769US2025291253A1Apparatus for photoresist dry depositionLAM RES CORP·Filed 2025·Application pending·0 cites
- 1869US2025244672A1Bake strategies to enhance lithographic performance of metal-containing resistLAM RES CORP·Filed 2025·Application pending·0 cites
- 1956US2022308462A1Apparatus for photoresist dry depositionLAM RES CORP·Filed 2020·Application pending·0 cites
- 2052US2023314946A1Method of forming photo-sensitive hybrid filmsLAM RES CORP·Filed 2021·Application pending·0 cites
- 2150US2025226227A1Deposition of metal-containing films and chamber cleanLAM RES CORP·Filed 2023·Application pending·0 cites
- 2247US2022365434A1Substrate surface modification with high euv absorbers for high performance euv photoresistsLAM RES CORP·Filed 2020·Application pending·0 cites
- 2344US2022344136A1Dry chamber clean of photoresist filmsLAM RES CORP·Filed 2020·Application pending·0 cites
- 2442US10103056B2Methods for wet metal seed deposition for bottom up gapfill of featuresLAM RES CORP·Filed 2017·Granted Oct 16, 2018·0 cites·27 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →