Inventor · disambiguated record
Byung Seok Kwon
Also filed as: Kwon byung seok
5 granted patents·7 pending applications·0 citations·filing 2018–2024
61Inventor score
Top patents by PatentIndex Score
12 records- 0175US2023151487A1Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0273US2025022709A1Plasma-enhanced chemical vapor deposition of carbon hard-maskAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0368US11560623B2Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·0 cites·16 claims
- 0467US10522192B1Coated slider to inhibit contamination accumulationSEAGATE TECHNOLOGY LLC·Filed 2018·Granted Dec 31, 2019·0 cites·19 claims
- 0558US12136549B2Plasma-enhanced chemical vapor deposition of carbon hard-maskAPPLIED MATERIALS INC·Filed 2019·Granted Nov 5, 2024·0 cites·20 claims
- 0651US2020140999A1Process chamber component cleaning methodAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 0750US11830706B2Heated pedestal design for improved heat transfer and temperature uniformityAPPLIED MATERIALS INC·Filed 2019·Granted Nov 28, 2023·0 cites·19 claims
- 0850US10692542B2Coated slider to inhibit contamination accumulationSEAGATE TECHNOLOGY LLC·Filed 2019·Granted Jun 23, 2020·0 cites·19 claims
- 0946US2020328066A1Plasma densification within a processing chamberAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1044US2020249263A1Method and tool for electrostatic chuckingAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1144US2020255940A1Method for cleaning process chamberAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1241US2021017645A1Resolving spontaneous arcing during thick film deposition of high temperature amorphous carbon depositionAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Byung Seok Kwon files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →