Inventor · disambiguated record
Byounghoon Lee
Also filed as: LEE BYOUNGHOON
15 granted patents·11 pending applications·16 citations·filing 2006–2024
87Inventor score
Files withSAMSUNG ELECTRONICS CO LTD23HASEBE KAZUHIDE1SEOUL NAT UNIV R&DB FOUNDATION1TOKYO ELECTRON LTD1
Top patents by PatentIndex Score
26 records- 0192US11145738B2Semiconductor devices having multiple barrier patternsSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Oct 12, 2021·3 cites·20 claims
- 0291US11387236B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jul 12, 2022·3 cites·20 claims
- 0388US8343594B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2008·Granted Jan 1, 2013·8 cites·14 claims
- 0480US11296078B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Apr 5, 2022·2 cites·19 claims
- 0577US2024250144A1Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0675US11948994B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Apr 2, 2024·0 cites·5 claims
- 0770US11778835B2Semiconductor switching devices having ferroelectric layers therein and methods of fabricating sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Oct 3, 2023·0 cites·20 claims
- 0867US12080712B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Sep 3, 2024·0 cites·20 claims
- 0965US11610975B2Semiconductor devices having multiple barrier patternsSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Mar 21, 2023·0 cites·20 claims
- 1064US11217677B2Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 4, 2022·0 cites·20 claims
- 1163US12251690B2Single atom catalyst and method of forming the sameSEOUL NAT UNIV R&DB FOUNDATION·Filed 2020·Granted Mar 18, 2025·0 cites·6 claims
- 1263US12062661B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Aug 13, 2024·0 cites·10 claims
- 1363US2025212395A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1462US11335701B2Semiconductor switching devices having ferroelectric layers therein and methods of fabricating sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 17, 2022·0 cites·11 claims
- 1560US2025201700A1Integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1658US2024258393A1Gate structures and semiconductor devices including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1758US2025248099A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1857US2006207504A1Film formation method and apparatus for semiconductor processHASEBE KAZUHIDE·Filed 2006·Application pending·0 cites
- 1957US2024407152A1Gate structures and semiconductor devices including the gate structuresSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2056US2024349487A1Gate structure and method of forming the same, semiconductor device including the gate structure and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2156US2025107073A1Semiconductor devices including bit linesSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2255US2025132198A1Method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2354US2024381627A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2448US11333979B2Methods of forming a pattern and methods of fabricating a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 17, 2022·0 cites·20 claims
- 2545US10950709B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Mar 16, 2021·0 cites·19 claims
- 2641US12100736B2Semiconductor device having channel layers spaced apart in vertical directionSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Sep 24, 2024·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →