Inventor · disambiguated record
Casparus Anthonius Henricus Juffermans
Also filed as: JUFFERMANS CASPARUS A H · JUFFERMANS CASPARUS ANTHONIUS · JUFFERMANS CASPARUS ANTHONIUS HENRICUS
11 granted patents·2 pending applications·224 citations·filing 1997–2021
90Inventor score
Top patents by PatentIndex Score
13 records- 0194US6368763B2Method of detecting aberrations of an optical imaging systemPHILIPS CORP·Filed 2001·Granted Apr 9, 2002·69 cites·10 claims
- 0292US6248486B1Method of detecting aberrations of an optical imaging systemPHILIPS CORP·Filed 1999·Granted Jun 19, 2001·91 cites·8 claims
- 0378US7037626B2Lithographic method of manufacturing a deviceKONINKL PHILIPS ELECTRONICS NV·Filed 2002·Granted May 2, 2006·19 cites·17 claims
- 0478US6331368B2Test object for use in detecting aberrations of an optical imaging systemPHILIPS CORP·Filed 2001·Granted Dec 18, 2001·14 cites·7 claims
- 0576US6544694B2Method of manufacturing a device by means of a mask phase-shifting mask for use in said methodKONINKL PHILIPS ELECTRONICS NV·Filed 2001·Granted Apr 8, 2003·15 cites·13 claims
- 0651US7659041B2Lithographic method of manufacturing a deviceKONINKL PHILIPS ELECTRONICS NV·Filed 2006·Granted Feb 9, 2010·0 cites·11 claims
- 0751US6960764B2Method of measuring the performance of a scanning electron microscopeKONINKL PHILIPS ELECTRONICS NV·Filed 2002·Granted Nov 1, 2005·2 cites·4 claims
- 0847US7423739B2Method of and system for determining the aberration of an imaging system test object and detector for use with the methodKONINKL PHILIPS ELECTRONICS NV·Filed 2002·Granted Sep 9, 2008·2 cites·23 claims
- 0943US2023222250A1Centralized handling of ic identification codesSANDGRAIN B V·Filed 2021·Application pending·0 cites
- 1040US6291352B1Method of manufacturing a semiconductor devicePHILIPS CORP·Filed 1998·Granted Sep 18, 2001·8 cites·17 claims
- 1138US2006206851A1Determning lithographic parameters to optimise a process windowKONINKL PHILIPS ELECTRONICS NV·Filed 2003·Application pending·0 cites
- 1233US7599811B2Sensor for lithographic apparatus and method of obtaining measurements of lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Oct 6, 2009·0 cites·34 claims
- 1333US5866283AMethod of monitoring a photolithographic process through utilization of fractional radiant energy test patternPHILIPS CORP·Filed 1997·Granted Feb 2, 1999·4 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →