Inventor · disambiguated record
Carter W. Kaanta
Also filed as: KAANTA CARTER W · KAANTA CARTER WELLING
29 granted patents·2,742 citations·filing 1985–1998
98Inventor score
Files withIBM29
Top patents by PatentIndex Score
29 records- 0199US4793895AIn situ conductivity monitoring technique for chemical/mechanical planarization endpoint detectionIBM·Filed 1988·Granted Dec 27, 1988·330 cites·18 claims
- 0297US5795830AReducing pitch with continuously adjustable line and space dimensionsIBM·Filed 1996·Granted Aug 18, 1998·321 cites·14 claims
- 0397US4789648AMethod for producing coplanar multi-level metal/insulator films on a substrate and for forming patterned conductive lines simultaneously with stud viasIBM·Filed 1985·Granted Dec 6, 1988·526 cites·6 claims
- 0496US5126006APlural level chip maskingIBM·Filed 1991·Granted Jun 30, 1992·133 cites·35 claims
- 0596US4956313AVia-filling and planarization techniqueIBM·Filed 1988·Granted Sep 11, 1990·207 cites·10 claims
- 0695US5036630ARadial uniformity control of semiconductor wafer polishingIBM·Filed 1990·Granted Aug 6, 1991·107 cites·13 claims
- 0794US4987101AMethod for providing improved insulation in VLSI and ULSI circuitsIBM·Filed 1988·Granted Jan 22, 1991·118 cites·11 claims
- 0892US4919750AEtching metal films with complexing chloride plasmaIBM·Filed 1989·Granted Apr 24, 1990·132 cites·7 claims
- 0989US5034348AProcess for forming refractory metal silicide layers of different thicknesses in an integrated circuitIBM·Filed 1990·Granted Jul 23, 1991·129 cites·24 claims
- 1087US5760475ARefractory metal-titanium nitride conductive structuresIBM·Filed 1994·Granted Jun 2, 1998·68 cites·3 claims
- 1186US5708559APrecision analog metal-metal capacitorIBM·Filed 1995·Granted Jan 13, 1998·85 cites·10 claims
- 1286US5213916AMethod of making a gray level maskIBM·Filed 1990·Granted May 25, 1993·45 cites·25 claims
- 1380US6008083APrecision analog metal-metal capacitorIBM·Filed 1997·Granted Dec 28, 1999·59 cites·21 claims
- 1480US5466636AMethod of forming borderless contacts using a removable mandrelIBM·Filed 1992·Granted Nov 14, 1995·63 cites·24 claims
- 1577US5496771AMethod of making overpass mask/insulator for local interconnectsIBM·Filed 1994·Granted Mar 5, 1996·53 cites·36 claims
- 1677US5334467AGray level maskIBM·Filed 1993·Granted Aug 2, 1994·27 cites·5 claims
- 1776US5091289AProcess for forming multi-level coplanar conductor/insulator films employing photosensitive polyimide polymer compositionsIBM·Filed 1990·Granted Feb 25, 1992·56 cites·13 claims
- 1873US5189506ATriple self-aligned metallurgy for semiconductor devicesIBM·Filed 1992·Granted Feb 23, 1993·45 cites·3 claims
- 1972US5759911ASelf-aligned metallurgyIBM·Filed 1995·Granted Jun 2, 1998·36 cites·18 claims
- 2070US4944682AMethod of forming borderless contactsIBM·Filed 1989·Granted Jul 31, 1990·36 cites·10 claims
- 2167US5677563AGate stack structure of a field effect transistorIBM·Filed 1997·Granted Oct 14, 1997·32 cites·9 claims
- 2264US4758306AStud formation method optimizing insulator gap-fill and metal hole-fillIBM·Filed 1987·Granted Jul 19, 1988·28 cites·9 claims
- 2357US5136124AMethod of forming conductors within an insulating substrateIBM·Filed 1990·Granted Aug 4, 1992·27 cites·4 claims
- 2453US5229257AProcess for forming multi-level coplanar conductor/insulator films employing photosensitive polymide polymer compositionsIBM·Filed 1990·Granted Jul 20, 1993·22 cites·11 claims
- 2551US4985990AMethod of forming conductors within an insulating substrateIBM·Filed 1988·Granted Jan 22, 1991·17 cites·14 claims
- 2647US5144411AMethod and structure for providing improved insulation in vlsi and ulsi circuitsIBM·Filed 1990·Granted Sep 1, 1992·14 cites·4 claims
- 2743US6576848B1Integrated circuit chip wiring structure with crossover capability and method of manufacturing the sameIBM·Filed 1996·Granted Jun 10, 2003·11 cites·7 claims
- 2842US6429473B1DRAM cell with stacked capacitor self-aligned to bitlineIBM·Filed 1996·Granted Aug 6, 2002·7 cites·17 claims
- 2942US5976963ASelf-aligned metallurgyIBM·Filed 1998·Granted Nov 2, 1999·8 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →