Inventor · disambiguated record
Christopher P. Ausschnitt
Also filed as: AUSSCHNITT CHRISTOPHER · AUSSCHNITT CHRISTOPHER P · AUSSCHNITT CHRISTOPHER PERRY
64 granted patents·3 pending applications·3,994 citations·filing 1978–2023
99Inventor score
Top patents by PatentIndex Score
67 records- 0199US6130750AOptical metrology tool and method of using sameIBM·Filed 1997·Granted Oct 10, 2000·295 cites·10 claims
- 0298US5805290AMethod of optical metrology of unresolved pattern arraysIBM·Filed 1996·Granted Sep 8, 1998·209 cites·20 claims
- 0397US7626702B2Overlay target and measurement method using reference and sub-gridsIBM·Filed 2008·Granted Dec 1, 2009·60 cites·11 claims
- 0497US6317211B1Optical metrology tool and method of using sameIBM·Filed 1999·Granted Nov 13, 2001·141 cites·12 claims
- 0597US5877861AMethod for overlay control systemIBM·Filed 1997·Granted Mar 2, 1999·273 cites·15 claims
- 0697US5757507AMethod of measuring bias and edge overlay error for sub-0.5 micron ground rulesIBM·Filed 1995·Granted May 26, 1998·263 cites·40 claims
- 0796US8035824B2Differential critical dimension and overlay metrology apparatus and measurement methodIBM·Filed 2009·Granted Oct 11, 2011·21 cites·8 claims
- 0896US7474401B2Multi-layer alignment and overlay target and measurement methodIBM·Filed 2005·Granted Jan 6, 2009·38 cites·32 claims
- 0996US6869739B1Integrated lithographic print and detection model for optical CDIBM·Filed 2003·Granted Mar 22, 2005·95 cites·21 claims
- 1096US5712707AEdge overlay measurement target for sub-0.5 micron ground rulesIBM·Filed 1995·Granted Jan 27, 1998·218 cites·33 claims
- 1196US5629772AMonitoring of minimum features on a substrateIBM·Filed 1994·Granted May 13, 1997·127 cites·11 claims
- 1296US4538105AOverlay test waferPERKIN ELMER CORP·Filed 1983·Granted Aug 27, 1985·110 cites·14 claims
- 1395US6137578ASegmented bar-in-bar targetIBM·Filed 1998·Granted Oct 24, 2000·139 cites·18 claims
- 1495US6128089ACombined segmented and nonsegmented bar-in-bar targetsIBM·Filed 1998·Granted Oct 3, 2000·194 cites·10 claims
- 1594US8339605B2Multilayer alignment and overlay target and measurement methodAUSSCHNITT CHRISTOPHER P·Filed 2010·Granted Dec 25, 2012·11 cites·4 claims
- 1694US7455939B2Method of improving grating test pattern for lithography monitoring and controllingIBM·Filed 2006·Granted Nov 25, 2008·18 cites·10 claims
- 1794US6937337B2Overlay target and measurement method using reference and sub-gridsIBM·Filed 2003·Granted Aug 30, 2005·56 cites·14 claims
- 1893US5965309AFocus or exposure dose parameter control system using tone reversing patternsIBM·Filed 1997·Granted Oct 12, 1999·116 cites·10 claims
- 1993US5914784AMeasurement method for linewidth metrologyIBM·Filed 1997·Granted Jun 22, 1999·101 cites·25 claims
- 2092US7700247B2Differential critical dimension and overlay metrology apparatus and measurement methodIBM·Filed 2003·Granted Apr 20, 2010·39 cites·15 claims
- 2192US7439001B2Focus blur measurement and control methodIBM·Filed 2005·Granted Oct 21, 2008·13 cites·4 claims
- 2292US7359054B2Overlay target and measurement method using reference and sub-gridsIBM·Filed 2005·Granted Apr 15, 2008·13 cites·16 claims
- 2392US6766211B1Structure and method for amplifying target overlay errors using the synthesized beat signal between interleaved arrays of differing periodicityIBM·Filed 2000·Granted Jul 20, 2004·47 cites·30 claims
- 2492US6638671B2Combined layer-to-layer and within-layer overlay control systemIBM·Filed 2001·Granted Oct 28, 2003·55 cites·20 claims
- 2592US6335151B1Micro-surface fabrication processIBM·Filed 1999·Granted Jan 1, 2002·96 cites·11 claims
- 2692US6020966AEnhanced optical detection of minimum features using depolarizationIBM·Filed 1998·Granted Feb 1, 2000·93 cites·29 claims
- 2792US4290384ACoating apparatusPERKIN ELMER CORP·Filed 1980·Granted Sep 22, 1981·98 cites·29 claims
- 2891US6027842AProcess for controlling etching parametersIBM·Filed 1999·Granted Feb 22, 2000·102 cites·11 claims
- 2991US5976740AProcess for controlling exposure dose or focus parameters using tone reversing patternIBM·Filed 1997·Granted Nov 2, 1999·100 cites·11 claims
- 3091US5953128AOptically measurable serpentine edge tone reversed targetsIBM·Filed 1997·Granted Sep 14, 1999·91 cites·23 claims
- 3190US8107079B2Multi layer alignment and overlay target and measurement methodAUSSCHNITT CHRISTOPHER P·Filed 2010·Granted Jan 31, 2012·6 cites·19 claims
- 3290US7042551B2Method of patterning process metrology based on the intrinsic focus offsetIBM·Filed 2004·Granted May 9, 2006·38 cites·22 claims
- 3390US6004706AEtching parameter control system processIBM·Filed 1999·Granted Dec 21, 1999·86 cites·10 claims
- 3490US4890239ALithographic process analysis and control systemSHIPLEY CO·Filed 1987·Granted Dec 26, 1989·82 cites·12 claims
- 3589US8874249B2Discrete sampling based nonlinear control systemIBM·Filed 2013·Granted Oct 28, 2014·8 cites·23 claims
- 3689US7876439B2Multi layer alignment and overlay target and measurement methodIBM·Filed 2008·Granted Jan 25, 2011·8 cites·34 claims
- 3789US6842237B2Phase shifted test pattern for monitoring focus and aberrations in optical projection systemsIBM·Filed 2001·Granted Jan 11, 2005·36 cites·17 claims
- 3889US6417929B1Optical measurement of lithographic power bias of minimum featuresIBM·Filed 2000·Granted Jul 9, 2002·38 cites·10 claims
- 3989US5790254AMonitoring of minimum features on a substrateIBM·Filed 1996·Granted Aug 4, 1998·70 cites·3 claims
- 4088US6879400B2Single tone process window metrology target and method for lithographic processingIBM·Filed 2000·Granted Apr 12, 2005·32 cites·22 claims
- 4188US6803995B2Focus control systemIBM·Filed 2001·Granted Oct 12, 2004·32 cites·20 claims
- 4287US8638438B2Self-calibrated alignment and overlay target and measurementAUSSCHNITT CHRISTOPHER P·Filed 2011·Granted Jan 28, 2014·5 cites·16 claims
- 4387US6346979B1Process and apparatus to adjust exposure dose in lithography systemsIBM·Filed 1999·Granted Feb 12, 2002·68 cites·36 claims
- 4486US10656535B2Metrology method for a semiconductor manufacturing processIMEC VZW·Filed 2018·Granted May 19, 2020·3 cites·20 claims
- 4586US4166219ADetection of ground state hydrogen and deuteriumBELL TELEPHONE LABOR INC·Filed 1978·Granted Aug 28, 1979·37 cites·7 claims
- 4685US10481504B2Method and apparatus for semiconductor manufacturingIMEC VZW·Filed 2017·Granted Nov 19, 2019·3 cites·16 claims
- 4785US9097989B2Target and method for mask-to-wafer CD, pattern placement and overlay measurement and controlAUSSCHNITT CHRISTOPHER P·Filed 2009·Granted Aug 4, 2015·8 cites·15 claims
- 4885US6429667B1Electrically testable process window monitor for lithographic processingIBM·Filed 2000·Granted Aug 6, 2002·35 cites·24 claims
- 4983US7957826B2Methods for normalizing error in photolithographic processesIBM·Filed 2007·Granted Jun 7, 2011·9 cites·4 claims
- 5082US6183919B1Darkfield imaging for enhancing optical detection of edges and minimum featuresIBM·Filed 1999·Granted Feb 6, 2001·41 cites·15 claims
Showing the top 50 of 67 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →